Inventor · disambiguated record
Atsuhiro Tsukune
Also filed as: TSUKUNE ATSUHIRO
10 granted patents·1 pending application·353 citations·filing 1987–2016
91Inventor score
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11 records- 0190US4804560AMethod of selectively depositing tungsten upon a semiconductor substrateFUJITSU LTD·Filed 1987·Granted Feb 14, 1989·125 cites·2 claims
- 0288US5609721ASemiconductor device manufacturing apparatus and its cleaning methodFUJITSU LTD·Filed 1995·Granted Mar 11, 1997·112 cites·21 claims
- 0386US8916468B2Semiconductor device fabrication methodFUJITSU SEMICONDUCTOR LTD·Filed 2013·Granted Dec 23, 2014·9 cites·19 claims
- 0482US8836126B2Semiconductor device having insulating layers containing oxygen and a barrier layer containing manganeseOCHIMIZU HIROSATO·Filed 2009·Granted Sep 16, 2014·11 cites·3 claims
- 0569US5041311AChemical vapor deposition method using a plasma self-cleaningFUJITSU LTD·Filed 1990·Granted Aug 20, 1991·29 cites·4 claims
- 0665US6635523B1Semiconductor device and method of manufacturing the sameFUJITSU LTD·Filed 1998·Granted Oct 21, 2003·30 cites·19 claims
- 0754US9704740B2Semiconductor device having insulating layers containing oxygen and a barrier layer containing manganeseFUJITSU SEMICONDUCTOR LTD·Filed 2016·Granted Jul 11, 2017·0 cites·7 claims
- 0854US2014353829A1Semiconductor device having insulating layers containing oxygen and a barrier layer containing manganeseFUJITSU SEMICONDUCTOR LTD·Filed 2014·Application pending·0 cites
- 0944US4781945AProcess for the formation of phosphosilicate glass coatingFUJITSU LTD·Filed 1987·Granted Nov 1, 1988·14 cites·12 claims
- 1043US5233163AGraphite columnar heating body for semiconductor wafer heatingFUJITSU LTD·Filed 1991·Granted Aug 3, 1993·14 cites·23 claims
- 1140US6344363B1Method of making ferroelectric film with protective cover film against hydrogen and moistureFUJITSU LTD·Filed 1998·Granted Feb 5, 2002·9 cites·10 claims
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