Inventor · disambiguated record
Martin M. Mitan
Also filed as: MITAN MARTIN · MITAN MARTIN M
9 granted patents·3 pending applications·20 citations·filing 2002–2023
82Inventor score
Top patents by PatentIndex Score
12 records- 0184US11869889B2Self-aligned gate endcap (SAGE) architectures without fin end gapINTEL CORP·Filed 2019·Granted Jan 9, 2024·4 cites·22 claims
- 0283US10720508B2Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride cappingINTEL CORP·Filed 2015·Granted Jul 21, 2020·3 cites·15 claims
- 0380US10396176B2Selective gate spacers for semiconductor devicesINTEL CORP·Filed 2014·Granted Aug 27, 2019·3 cites·23 claims
- 0477US10971600B2Selective gate spacers for semiconductor devicesINTEL CORP·Filed 2019·Granted Apr 6, 2021·1 cites·16 claims
- 0572US11532724B2Selective gate spacers for semiconductor devicesINTEL CORP·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 0668US2024088143A1Self-aligned gate endcap (sage) architectures without fin end gapINTEL CORP·Filed 2023·Application pending·0 cites
- 0766US10998423B2Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride cappingINTEL CORP·Filed 2020·Granted May 4, 2021·0 cites·22 claims
- 0861US6750124B1Direct patterning of nanometer-scale silicide structures on silicon by ion-beam implantation through a thin barrier layerUNIV ARIZONA·Filed 2002·Granted Jun 15, 2004·9 cites·23 claims
- 0951US11810980B2Channel formation for three dimensional transistorsINTEL CORP·Filed 2019·Granted Nov 7, 2023·0 cites·21 claims
- 1046US2021408239A1Plasma nitridation for gate oxide scaling of ge and sige transistorsINTEL CORP·Filed 2020·Application pending·0 cites
- 1142US10896852B2Methods for doping a sub-fin region of a semiconductor fin structure and devices containing the sameINTEL CORP·Filed 2015·Granted Jan 19, 2021·0 cites·25 claims
- 1232US2018130707A1Bottom-up fill (buf) of metal features for semiconductor structuresINTEL CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →