Inventor · disambiguated record
Bruno La Fontaine
Also filed as: LA FONTAINE BRUNO · LA FONTAINE BRUNO M
19 granted patents·5 pending applications·237 citations·filing 1994–2022
94Inventor score
Files withASML NETHERLANDS BV10ADVANCED MICRO DEVICES INC9AT & T CORP1CYMER INC1DUPONT PHOTOMASKS INC1
Top patents by PatentIndex Score
24 records- 0193US6645679B1Attenuated phase shift mask for use in EUV lithography and a method of making such a maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 11, 2003·51 cites·20 claims
- 0289US9557650B2Transport system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Jan 31, 2017·5 cites·29 claims
- 0387US6555274B1Pupil filtering for a lithographic toolFiled 2001·Granted Apr 29, 2003·27 cites·20 claims
- 0486US6608321B1Differential wavelength inspection systemADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 19, 2003·34 cites·20 claims
- 0585US6556286B1Inspection system for the pupil of a lithographic toolADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 29, 2003·24 cites·20 claims
- 0682US11126092B2Methods for determining an approximate value of a processing parameter at which a characteristic of the patterning process has a target valueASML NETHERLANDS BV·Filed 2016·Granted Sep 21, 2021·3 cites·20 claims
- 0782US6710853B1Phase grating focus monitor using overlay techniqueADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 23, 2004·22 cites·15 claims
- 0881US11733613B2Prediction of out of specification based on a spatial characteristic of process variabilityASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·2 cites·20 claims
- 0976US10908515B2Method and apparatus for pattern fidelity controlASML NETHERLANDS BV·Filed 2017·Granted Feb 2, 2021·1 cites·20 claims
- 1075US6603543B1Inspection system with enhanced contrastADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 5, 2003·13 cites·20 claims
- 1175US6535280B1Phase-shift-moiré focus monitorADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·14 cites·14 claims
- 1270US7101645B1Reflective mask for short wavelength lithographyDUPONT PHOTOMASKS INC·Filed 2003·Granted Sep 5, 2006·12 cites·18 claims
- 1370US6872497B1Reflective mask for short wavelength lithographyADVANCED MICRO DEVICES INC·Filed 2003·Granted Mar 29, 2005·11 cites·21 claims
- 1469US11669020B2Method and apparatus for pattern fidelity controlASML NETHERLANDS BV·Filed 2021·Granted Jun 6, 2023·0 cites·20 claims
- 1568US10185234B2Harsh environment optical element protectionCYMER INC·Filed 2012·Granted Jan 22, 2019·1 cites·7 claims
- 1665US9560730B2Transport system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2013·Granted Jan 31, 2017·1 cites·44 claims
- 1761US8642474B2Spacer lithographyKIM RYOUNG-HAN·Filed 2007·Granted Feb 4, 2014·1 cites·19 claims
- 1860US5498923AFluoresence imagingAT & T CORP·Filed 1994·Granted Mar 12, 1996·15 cites·14 claims
- 1953US2024186106A1On system self-diagnosis and self-calibration technique for charged particle beam systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2051US2024312758A1System and method for adjusting beam current using a feedback loop in charged particle systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2149US2023298851A1Systems and methods for signal electron detection in an inspection apparatusASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2248US11403453B2Defect predictionASML NETHERLANDS BV·Filed 2018·Granted Aug 2, 2022·0 cites·20 claims
- 2345US2009135390A1Lithographic alignment marksADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
- 2439US2009033892A1Double exposure of a photoresist layer using a single reticleADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →