Inventor · disambiguated record
Tatsuo Matsudo
Also filed as: MATSUDO TATSUO
56 granted patents·21 pending applications·540 citations·filing 2001–2024
98Inventor score
Top patents by PatentIndex Score
77 records- 0197US8703002B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Apr 22, 2014·343 cites·8 claims
- 0295US10325758B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 18, 2019·13 cites·23 claims
- 0394US11315765B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 26, 2022·8 cites·7 claims
- 0493US8070911B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2006·Granted Dec 6, 2011·16 cites·20 claims
- 0591US7582182B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 1, 2009·14 cites·6 claims
- 0688US7713431B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2005·Granted May 11, 2010·16 cites·3 claims
- 0786US9500537B2Temperature measurement apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Nov 22, 2016·2 cites·1 claims
- 0886US9163931B2Apparatus and method for measuring thickness and temperature and substrate processing systemTOKYO ELECTRON LTD·Filed 2014·Granted Oct 20, 2015·6 cites·11 claims
- 0985US10184786B2Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing systemTOKYO ELECTRON LTD·Filed 2014·Granted Jan 22, 2019·6 cites·5 claims
- 1085US9070725B2Measuring apparatus and plasma processing apparatusMATSUDO TATSUO·Filed 2012·Granted Jun 30, 2015·7 cites·7 claims
- 1184US8730482B2Method for measuring wear rateMATSUDO TATSUO·Filed 2011·Granted May 20, 2014·8 cites·10 claims
- 1282US7532322B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted May 12, 2009·6 cites·25 claims
- 1382US7339656B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 4, 2008·20 cites·31 claims
- 1482US7163877B2Method and system for modifying a gate dielectric stack containing a high-k layer using plasma processingTEXAS INSTRUMENTS INC·Filed 2004·Granted Jan 16, 2007·26 cites·51 claims
- 1581US9412562B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 9, 2016·2 cites·14 claims
- 1678US9028139B2Method of measuring temperature of component in processing chamber of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted May 12, 2015·3 cites·9 claims
- 1778US8825434B2Temperature measuring method, storage medium, and programKOSHIMIZU CHISHIO·Filed 2011·Granted Sep 2, 2014·4 cites·7 claims
- 1877US8573837B2Temperature measuring apparatus and temperature measuring methodMATSUDO TATSUO·Filed 2012·Granted Nov 5, 2013·5 cites·6 claims
- 1976US12482635B2Plasma processing device, and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Granted Nov 25, 2025·0 cites·12 claims
- 2076US10937631B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 2, 2021·1 cites·12 claims
- 2174US9038566B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2011·Granted May 26, 2015·2 cites·17 claims
- 2274US8824875B2Method for heating part in processing chamber of semiconductor manufacturing apparatus and semiconductor manufacturing apparatusYAMAWAKU JUN·Filed 2011·Granted Sep 2, 2014·3 cites·5 claims
- 2372US8486221B2Focus ring heating method, plasma etching apparatus, and plasma etching methodKOSHIMIZU CHISHIO·Filed 2010·Granted Jul 16, 2013·2 cites·42 claims
- 2471US8425791B2In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including sameKOSHIMIZU CHISHIO·Filed 2009·Granted Apr 23, 2013·2 cites·4 claims
- 2569US10734201B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·1 cites·8 claims
- 2669US8182142B2Temperature measuring apparatus and temperature measuring methodABE JUN·Filed 2008·Granted May 22, 2012·4 cites·5 claims
- 2768US8858753B2Focus ring heating method, plasma etching apparatus, and plasma etching methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 14, 2014·1 cites·17 claims
- 2868US8585284B2Temperature measurement apparatus and methodABE JUN·Filed 2012·Granted Nov 19, 2013·1 cites·4 claims
- 2967US8986494B2Plasma processing apparatus and temperature measuring method and apparatus used thereinMATSUDO TATSUO·Filed 2010·Granted Mar 24, 2015·2 cites·9 claims
- 3067US7952717B2Temperature measuring apparatus and temperature measuring methodTOKYO ELECTRON LTD·Filed 2008·Granted May 31, 2011·6 cites·7 claims
- 3166US8651049B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Feb 18, 2014·1 cites·12 claims
- 3266US8523428B2Component in processing chamber of substrate processing apparatus and method of measuring temperature of the componentYAMAWAKU JUN·Filed 2012·Granted Sep 3, 2013·1 cites·14 claims
- 3365US12027344B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 2, 2024·0 cites·9 claims
- 3464US11443920B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 13, 2022·0 cites·7 claims
- 3564US2025140527A1Radical Supply Device, Radical Processing Device, Radical Generation Method and Substrate Processing MethodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3663US2023167554A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3760US10283328B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted May 7, 2019·0 cites·22 claims
- 3860US9952032B2Temperature measuring method, substrate processing system and component to be provided in substrate processing apparatus of the substrate processing systemTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·0 cites·11 claims
- 3960US9022645B2Plasma processing apparatus and temperature measuring methodMATSUDO TATSUO·Filed 2012·Granted May 5, 2015·1 cites·6 claims
- 4059US12020900B2Plasma processing device, and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Jun 25, 2024·0 cites·10 claims
- 4159US11328904B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 10, 2022·0 cites·5 claims
- 4258US12387908B2Plasma treatment apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Aug 12, 2025·0 cites·7 claims
- 4358US2018231369A1Temperature measuring method, substrate processing system and component to be provided in substrate processing apparatus of the substrate processing systemTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 4457US12191124B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 7, 2025·0 cites·16 claims
- 4557US9304050B2Temperature measurement apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Apr 5, 2016·0 cites·2 claims
- 4656US10746531B2Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Aug 18, 2020·0 cites·5 claims
- 4756US2014286375A1Temperature measuring apparatus and temperature measuring methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 4855US8144332B2Temperature measurement apparatus and methodABE JUN·Filed 2009·Granted Mar 27, 2012·1 cites·8 claims
- 4955US2009236043A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 5053US6747748B2Manufacturing method for a field-effect transistor, manufacturing method for a semiconductor device, and apparatus thereforTOKYO ELECTRON LTD·Filed 2001·Granted Jun 8, 2004·6 cites·10 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
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