Inventor · disambiguated record
James P. Shiely
Also filed as: SHIELY JAMES · SHIELY JAMES P · SHIELY JAMES PATRICK
18 granted patents·83 citations·filing 2005–2017
93Inventor score
Top patents by PatentIndex Score
18 records- 0193US7251807B2Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jul 31, 2007·14 cites·12 claims
- 0290US8443308B2EUV lithography flare calculation and compensationSHIELY JAMES·Filed 2011·Granted May 14, 2013·12 cites·20 claims
- 0385US8826193B1Detection and removal of self-aligned double patterning artifactsSYNOPSYS INC·Filed 2013·Granted Sep 2, 2014·5 cites·42 claims
- 0483US7243332B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jul 10, 2007·10 cites·12 claims
- 0582US8972229B2Fast 3D mask model based on implicit countorsSYNOPSYS INC·Filed 2013·Granted Mar 3, 2015·9 cites·19 claims
- 0681US7784018B2Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity modelSYNOPSYS INC·Filed 2007·Granted Aug 24, 2010·4 cites·4 claims
- 0780US8423917B2Modeling thin-film stack topography effect on a photolithography processSONG HUA·Filed 2009·Granted Apr 16, 2013·6 cites·23 claims
- 0877US7320119B2Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity modelSYNOPSYS INC·Filed 2005·Granted Jan 15, 2008·3 cites·14 claims
- 0976US8689149B1Multi-patterning for sharp corner printingSYNOPSYS INC·Filed 2013·Granted Apr 1, 2014·2 cites·32 claims
- 1076US7494751B2Method and apparatus for improving depth of focus during optical lithographySYNOPSYS INC·Filed 2005·Granted Feb 24, 2009·4 cites·18 claims
- 1175US9646127B23D resist profile aware etch-bias modelSYNOPSYS INC·Filed 2015·Granted May 9, 2017·2 cites·20 claims
- 1270US9484186B2Modeling and correcting short-range and long-range effects in E-beam lithographySYNOPSYS INC·Filed 2012·Granted Nov 1, 2016·3 cites·24 claims
- 1369US8291353B2Non-linear rasterized contour filtersDENG ZHIJIE·Filed 2011·Granted Oct 16, 2012·3 cites·19 claims
- 1463US7933471B2Method and system for correlating physical model representation to pattern layoutSYNOPSYS INC·Filed 2007·Granted Apr 26, 2011·3 cites·21 claims
- 1562US7308673B2Method and apparatus for correcting 3D mask effectsSYNOPSYS INC·Filed 2005·Granted Dec 11, 2007·1 cites·21 claims
- 1661US8132128B2Method and system for performing lithography verification for a double-patterning processSONG HUA·Filed 2008·Granted Mar 6, 2012·2 cites·24 claims
- 1756US11200362B23D resist profile aware resolution enhancement techniquesSYNOPSYS INC·Filed 2017·Granted Dec 14, 2021·0 cites·15 claims
- 1841US8601404B2Modeling EUV lithography shadowing effectSONG HUA·Filed 2012·Granted Dec 3, 2013·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →