Inventor · disambiguated record
Bill Quon
Also filed as: QUON BILL H
13 granted patents·6 pending applications·312 citations·filing 1996–2005
93Inventor score
Top patents by PatentIndex Score
19 records- 0196US7164236B2Method and apparatus for improved plasma processing uniformityTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·66 cites·15 claims
- 0295US6885153B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2003·Granted Apr 26, 2005·73 cites·23 claims
- 0392US6414606B1Enhanced paint for microwave/millimeter wave radiometric detection applications and method of road marker detectionTRW INC·Filed 2000·Granted Jul 2, 2002·47 cites·2 claims
- 0487US7019543B2Impedance monitoring system and methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 28, 2006·28 cites·27 claims
- 0574US7482757B2Inductively coupled high-density plasma sourceTOKYO ELECTRON LTD·Filed 2002·Granted Jan 27, 2009·13 cites·36 claims
- 0670US6899527B2Closed-drift hall effect plasma vacuum pump for process reactorsTOKYO ELECTRON LTD·Filed 2003·Granted May 31, 2005·10 cites·15 claims
- 0768US6729850B2Applied plasma duct systemTOKYO ELECTRON LTD·Filed 2002·Granted May 4, 2004·8 cites·30 claims
- 0863US6873113B2Stand alone plasma vacuum pumpTOKYO ELECTRON LTD·Filed 2002·Granted Mar 29, 2005·5 cites·16 claims
- 0961US6157320AEnhanced paint for microwave/millimeter wave radiometric detection applications and method of road marker detectionTRW INC·Filed 1999·Granted Dec 5, 2000·23 cites·2 claims
- 1056US5789622AFocal plane array calibration methodTRW INC·Filed 1996·Granted Aug 4, 1998·23 cites·23 claims
- 1150US6979954B2Inter-stage plasma sourceTOKYO ELECTRON LTD·Filed 2003·Granted Dec 27, 2005·1 cites·11 claims
- 1249US6194486B1Enhanced paint for microwave/millimeter wave radiometric detection applications and method of road marker detectionTRW INC·Filed 1997·Granted Feb 27, 2001·15 cites·7 claims
- 1343US7216067B2Non-linear test load and method of calibrating a plasma systemTOKYO ELECTRON LTD·Filed 2003·Granted May 8, 2007·0 cites·13 claims
- 1443US2003137251A1Method and apparatus for improved plasma processing uniformityFiled 2003·Application pending·0 cites
- 1540US2004219737A1Method and apparatus for processing a workpiece with a plasmaTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1638US2007074812A1Temperature control of plasma density probeMITROVIC ANDREJ·Filed 2005·Application pending·0 cites
- 1738US2003150562A1Apparatus and method to control the uniformity of plasma by reducing radial lossFiled 2003·Application pending·0 cites
- 1838US2003094239A1Apparatus and method for improving electron eccelerationFiled 2002·Application pending·0 cites
- 1936US2007074811A1Method and apparatus for measuring plasma density in processing reactors using a long dielectric tubeMOROZ PAUL·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →