Inventor · disambiguated record
Leonardus Leunissen
Also filed as: LEUNISSEN LEONARDUS
13 granted patents·5 pending applications·22 citations·filing 2006–2023
86Inventor score
Top patents by PatentIndex Score
18 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0382US7709160B2Method for manufacturing attenuated phase-shift masks and devices obtained therefromIMEC·Filed 2006·Granted May 4, 2010·7 cites·19 claims
- 0478US7695877B2Methods and devices for lithography using electromagnetic radiation with short wavelengthsIMEC·Filed 2006·Granted Apr 13, 2010·5 cites·8 claims
- 0575US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0672US12351737B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Granted Jul 8, 2025·0 cites·12 claims
- 0769US2024002698A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Application pending·0 cites
- 0859US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 0955US2022049125A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1055US2022064485A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1147US2009223832A1Method and Apparatus for Preventing Galvanic Corrosion in Semiconductor ProcessingIMEC INTER UNI MICRO ELECTR·Filed 2009·Application pending·0 cites
- 1246US11725117B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Granted Aug 15, 2023·0 cites·17 claims
- 1345US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 1441US10865361B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2017·Granted Dec 15, 2020·0 cites·20 claims
- 1540US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 1640US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 1739US10844325B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·13 claims
- 1835US8735182B2Method for detecting embedded voids in a semiconductor substrateLEUNISSEN LEONARDUS·Filed 2012·Granted May 27, 2014·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →