Inventor · disambiguated record
Julian Proelss
Also filed as: PROELSS JULIAN
18 granted patents·6 pending applications·20 citations·filing 2006–2023
89Inventor score
Top patents by PatentIndex Score
24 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0382US8969276B2Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substratesBRAUN SIMON·Filed 2010·Granted Mar 3, 2015·7 cites·25 claims
- 0475US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0572US12351737B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Granted Jul 8, 2025·0 cites·12 claims
- 0669US2024002698A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Application pending·0 cites
- 0767US9828527B2Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acidBASF SE·Filed 2016·Granted Nov 28, 2017·1 cites·6 claims
- 0867US9765239B2Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V materialBASF SE·Filed 2014·Granted Sep 19, 2017·2 cites·13 claims
- 0959US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 1055US2022049125A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1155US2022064485A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1252US2011084238A1Process for preparing lithium vanadium oxides and their use as cathode materialBASF SE·Filed 2009·Application pending·0 cites
- 1350US9862862B2Chemical-mechanical polishing compositions comprising polyethylene imineBASF SE·Filed 2014·Granted Jan 9, 2018·0 cites·11 claims
- 1449US2016009955A1Chemical-mechanical polishing compositions comprising n,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acidBASF SE·Filed 2014·Application pending·0 cites
- 1547US10570316B2Chemical mechanical polishing (CMP) compositionBASF SE·Filed 2015·Granted Feb 25, 2020·0 cites·20 claims
- 1647US8119097B2Method for producing nanoparticulate solid materialsKLEINE JAEGER FRANK·Filed 2006·Granted Feb 21, 2012·0 cites·15 claims
- 1746US11725117B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Granted Aug 15, 2023·0 cites·17 claims
- 1845US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 1945US10090159B2Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymersBASF SE·Filed 2014·Granted Oct 2, 2018·0 cites·14 claims
- 2041US10865361B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2017·Granted Dec 15, 2020·0 cites·20 claims
- 2140US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 2240US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 2339US10844325B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·13 claims
- 2435US10844333B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →