Inventor · disambiguated record
Michael Binnard
Also filed as: BINNARD MICHAEL · BINNARD MICHAEL B · BINNARD MICHAEL BIRK
86 granted patents·60 pending applications·1,412 citations·filing 1998–2024
99Inventor score
Top patents by PatentIndex Score
146 records- 0199US7545479B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2007·Granted Jun 9, 2009·58 cites·4 claims
- 0299US7372538B2Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2005·Granted May 13, 2008·107 cites·106 claims
- 0399US7327435B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2005·Granted Feb 5, 2008·75 cites·19 claims
- 0499US6445093B1Planar motor with linear coil arraysNIKON CORP·Filed 2000·Granted Sep 3, 2002·202 cites·27 claims
- 0596US7368838B2High efficiency voice coil motorNIKON CORP·Filed 2005·Granted May 6, 2008·30 cites·8 claims
- 0696US6452292B1Planar motor with linear coil arraysNIKON CORP·Filed 2000·Granted Sep 17, 2002·193 cites·41 claims
- 0795US10254654B2Microelectromechanical mirror assemblyNIKON CORP·Filed 2017·Granted Apr 9, 2019·6 cites·20 claims
- 0895US6678038B2Apparatus and methods for detecting tool-induced shift in microlithography apparatusNIKON CORP·Filed 2001·Granted Jan 13, 2004·65 cites·38 claims
- 0994US12151378B2Vibration reduction system for precision robotics applicationsNIKON CORP·Filed 2021·Granted Nov 26, 2024·2 cites·24 claims
- 1094US12055193B2Vibration isolation systems with reaction masses and actuatorsNIKON CORP·Filed 2021·Granted Aug 6, 2024·2 cites·21 claims
- 1194US8488100B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2010·Granted Jul 16, 2013·6 cites·34 claims
- 1293US6788385B2Stage device, exposure apparatus and methodNIKON CORP·Filed 2002·Granted Sep 7, 2004·82 cites·62 claims
- 1393US6650079B2System and method to control planar motorsNIKON CORP·Filed 2001·Granted Nov 18, 2003·54 cites·37 claims
- 1491US6208045B1Electric motors and positioning devices having moving magnet arrays and six degrees of freedomNIKON CORP·Filed 1998·Granted Mar 27, 2001·118 cites·74 claims
- 1590US6686991B1Wafer stage assembly, servo control system, and method for operating the sameNIKON CORP·Filed 2000·Granted Feb 3, 2004·44 cites·38 claims
- 1689US6590639B1Active vibration isolation system having pressure controlNIKON CORP·Filed 2000·Granted Jul 8, 2003·35 cites·29 claims
- 1788US9726987B2Positioning system using surface pattern recognition and interpolationNIKON CORP·Filed 2015·Granted Aug 8, 2017·4 cites·20 claims
- 1888US7417714B2Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stageNIKON CORP·Filed 2005·Granted Aug 26, 2008·10 cites·25 claims
- 1987US6750625B2Wafer stage with magnetic bearingsNIKON CORP·Filed 2001·Granted Jun 15, 2004·38 cites·116 claims
- 2087US6523695B1Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systemsNIKON CORP·Filed 2000·Granted Feb 25, 2003·27 cites·25 claims
- 2187US6504162B1Stage device, control system, and method for stabilizing wafer stage and wafer tableNIKON CORP·Filed 2000·Granted Jan 7, 2003·31 cites·41 claims
- 2285US12066677B2Balanced active stabilizersNIKON CORP·Filed 2021·Granted Aug 20, 2024·1 cites·47 claims
- 2385US8705170B2High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locationsWILLIAMSON DAVID M·Filed 2009·Granted Apr 22, 2014·15 cites·14 claims
- 2485US8514367B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Aug 20, 2013·3 cites·18 claims
- 2584US11061338B2High-resolution position encoder with image sensor and encoded target patternNIKON CORP·Filed 2018·Granted Jul 13, 2021·3 cites·44 claims
- 2683US8634057B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2013·Granted Jan 21, 2014·1 cites·30 claims
- 2782US6927505B2Following stage planar motorNIKON CORP·Filed 2001·Granted Aug 9, 2005·27 cites·16 claims
- 2881US8269944B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineBINNARD MICHAEL·Filed 2007·Granted Sep 18, 2012·2 cites·45 claims
- 2980US10747117B2Extreme ultraviolet lithography system that utilizes pattern stitchingNIKON CORP·Filed 2019·Granted Aug 18, 2020·1 cites·20 claims
- 3080US8140288B2On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stageYANG PAI-HSUEH·Filed 2007·Granted Mar 20, 2012·6 cites·41 claims
- 3180US7656062B2Split coil linear motor for z forceNIKON CORP·Filed 2006·Granted Feb 2, 2010·8 cites·17 claims
- 3280US2024328478A1Vibration isolation systems with reaction masses and actuatorsNIKON CORP·Filed 2024·Application pending·0 cites
- 3380US2024369797A1Balanced active stabilizersNIKON CORP·Filed 2024·Application pending·0 cites
- 3479US9465305B2Method for determining a commutation offset and for determining a compensation map for a stageYANG PAI-HSUEH·Filed 2011·Granted Oct 11, 2016·3 cites·41 claims
- 3578US11982521B2Measurement of a change in a geometrical characteristic and/or position of a workpieceNIKON CORP·Filed 2018·Granted May 14, 2024·2 cites·24 claims
- 3678US6844694B2Stage assembly and exposure apparatus including the sameNIKON CORP·Filed 2001·Granted Jan 18, 2005·16 cites·23 claims
- 3777US10890849B2EUV lithography system for dense line patterningNIKON CORP·Filed 2017·Granted Jan 12, 2021·1 cites·18 claims
- 3877US10295911B2Extreme ultraviolet lithography system that utilizes pattern stitchingNIKON CORP·Filed 2017·Granted May 21, 2019·1 cites·31 claims
- 3976US11099483B2Euv lithography system for dense line patterningNIKON CORP·Filed 2017·Granted Aug 24, 2021·1 cites·29 claims
- 4076US2025130037A1Metrology for additive manufacturingNIKON CORP·Filed 2024·Application pending·0 cites
- 4175US6987559B2Vibration-attenuation devices having low lateral stiffness, and exposure apparatus comprising sameNIKON CORP·Filed 2002·Granted Jan 17, 2006·14 cites·39 claims
- 4275US6758313B2Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systemsNIKON CORP·Filed 2002·Granted Jul 6, 2004·14 cites·32 claims
- 4374US10712671B2Dense line extreme ultraviolet lithography system with distortion matchingNIKON CORP·Filed 2017·Granted Jul 14, 2020·1 cites·23 claims
- 4474US9778579B2System and method for controlling a temperature of a reaction assemblyNIKON CORP·Filed 2012·Granted Oct 3, 2017·3 cites·32 claims
- 4573US2018231898A1Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2018·Application pending·0 cites
- 4672US6956308B2Dual flow circulation system for a moverNIKON CORP·Filed 2003·Granted Oct 18, 2005·14 cites·19 claims
- 4772US6639654B2Wafer stage carrier and removal assemblyNIKON CORP·Filed 2001·Granted Oct 28, 2003·11 cites·58 claims
- 4872US6551045B2Wafer stage chamberNIKON CORP·Filed 2001·Granted Apr 22, 2003·14 cites·23 claims
- 4971US11300884B2Illumination system with curved 1d-patterned mask for use in EUV-exposure toolNIKON CORP·Filed 2019·Granted Apr 12, 2022·1 cites·46 claims
- 5071US9329493B2Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2013·Granted May 3, 2016·0 cites·24 claims
Showing the top 50 of 146 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →