Inventor · disambiguated record
Manfred Gawein Tenner
Also filed as: TENNER MANFRED G · TENNER MANFRED GAWEIN
9 granted patents·2 pending applications·215 citations·filing 1994–2014
89Inventor score
Files withPHILIPS CORP4ASML NETHERLANDS BV2SEWELL HARRY2ASML HOLDING NV1BIJNEN FRANCISCUS GODEFRIDUS CASPER1
Top patents by PatentIndex Score
11 records- 0192US8208121B2Alignment mark and a method of aligning a substrate comprising such an alignment markBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Jun 26, 2012·24 cites·34 claims
- 0285US5910847AMethod of determining the radiation dose in a lithographic apparatusPHILIPS CORP·Filed 1997·Granted Jun 8, 1999·59 cites·14 claims
- 0378US8625096B2Method and system for increasing alignment target contrastSEWELL HARRY·Filed 2010·Granted Jan 7, 2014·3 cites·23 claims
- 0478US5485272ARadiation-source unit for generating a beam having two directions of polarisation and two frequenciesPHILIPS CORP·Filed 1994·Granted Jan 16, 1996·51 cites·20 claims
- 0574US9753377B2Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Sep 5, 2017·2 cites·14 claims
- 0673US5917604AAlignment device and lithographic apparatus provided with such a devicePHILIPS CORP·Filed 1997·Granted Jun 29, 1999·46 cites·22 claims
- 0768US5673101AMethod of repetitively imaging a mask pattern on a substrate, and apparatus for performing the methodPHILIPS CORP·Filed 1995·Granted Sep 30, 1997·29 cites·14 claims
- 0863US8709908B2Improving alignment target contrast in a lithographic double patterning processSEWELL HARRY·Filed 2010·Granted Apr 29, 2014·1 cites·18 claims
- 0956US8980724B2Alignment target contrast in a lithographic double patterning processASML HOLDING NV·Filed 2014·Granted Mar 17, 2015·0 cites·20 claims
- 1047US2009073448A1Method of measuring the overlay error, an inspection apparatus and a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1137US2012218533A1Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatusLYULINA IRINA·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →