Inventor · disambiguated record
Karen Signorini
Also filed as: SIGNORINI KAREN · SIGNORINI KAREN T
11 granted patents·2 pending applications·188 citations·filing 2001–2007
91Inventor score
Top patents by PatentIndex Score
13 records- 0191US6485989B1MRAM sense layer isolationMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 26, 2002·58 cites·27 claims
- 0287US6831019B1Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodesMICRON TECHNOLOGY INC·Filed 2002·Granted Dec 14, 2004·33 cites·19 claims
- 0385US6783995B2Protective layers for MRAM devicesMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 31, 2004·40 cites·21 claims
- 0480US7307306B2Etch mask and method of forming a magnetic random access memory structureMICRON TECHNOLOGY INC·Filed 2006·Granted Dec 11, 2007·5 cites·30 claims
- 0580US7242067B1MRAM sense layer isolationMICRON TECHNOLOGY INC·Filed 2006·Granted Jul 10, 2007·6 cites·12 claims
- 0679US7211849B2Protective layers for MRAM devicesMICRON TECHNOLOGY INC·Filed 2004·Granted May 1, 2007·16 cites·23 claims
- 0776US7094700B2Plasma etching methods and methods of forming memory devices comprising a chalcogenide comprising layer received operably proximate conductive electrodesMICRON TECHNOLOGY INC·Filed 2004·Granted Aug 22, 2006·15 cites·51 claims
- 0867US6635499B1MRAM sense layer isolationMICRON TECHNOLOGY INC·Filed 2002·Granted Oct 21, 2003·9 cites·18 claims
- 0964US7482176B2Etch mask and method of forming a magnetic random access memory structureMICRON TECHNOLOGY INC·Filed 2007·Granted Jan 27, 2009·1 cites·33 claims
- 1057US7132299B2Method of forming a magnetic random access memory structureMICRON TECHNOLOGY INC·Filed 2004·Granted Nov 7, 2006·4 cites·56 claims
- 1150US6989576B1MRAM sense layer isolationMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 24, 2006·1 cites·8 claims
- 1248US2006202298A1Device produced by method for etching a layered substrateSIGNORINI KAREN T·Filed 2006·Application pending·0 cites
- 1339US2004041272A1Method for etching anti-reflectant coating layersFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →