Inventor · disambiguated record
Jung-Hyeon Lee
Also filed as: LEE JUNG-HYEON
19 granted patents·8 pending applications·147 citations·filing 1999–2012
94Inventor score
Top patents by PatentIndex Score
27 records- 0191US7892982B2Method for forming fine patterns of a semiconductor device using a double patterning processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 22, 2011·19 cites·20 claims
- 0282US6381165B1Semiconductor memory device having storage node electrodes offset from each otherSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Apr 30, 2002·30 cites·9 claims
- 0377US8778598B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Jul 15, 2014·3 cites·10 claims
- 0475US7132708B2Semiconductor memory device having self-aligned contacts and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Nov 7, 2006·6 cites·4 claims
- 0573US7449383B2Method of manufacturing a capacitor and method of manufacturing a dynamic random access memory device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 11, 2008·4 cites·20 claims
- 0672US8431331B2Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusionKANG YOOL·Filed 2008·Granted Apr 30, 2013·4 cites·20 claims
- 0772US6893779B2Phase shifting mask for manufacturing semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 17, 2005·13 cites·15 claims
- 0872US6885052B2Semiconductor memory device having self-aligned contacts and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Apr 26, 2005·17 cites·15 claims
- 0968US7375390B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 20, 2008·3 cites·5 claims
- 1068US6716746B1Semiconductor device having self-aligned contact and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Apr 6, 2004·16 cites·13 claims
- 1163US7064051B2Method of forming self-aligned contact pads of non-straight type semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 20, 2006·11 cites·15 claims
- 1261US7457058B2Optical element holder and projection exposure apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 25, 2008·1 cites·17 claims
- 1358US7205241B2Method for manufacturing semiconductor device with contact body extended in direction of bit lineSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 17, 2007·8 cites·33 claims
- 1456US7670761B2Method of forming a fine pattern of a semiconductor device using a resist reflow measurement keySAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Mar 2, 2010·0 cites·20 claims
- 1551US7176512B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·4 cites·14 claims
- 1649US7473497B2Phase shifting mask for manufacturing semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jan 6, 2009·0 cites·9 claims
- 1744US2008230929A1Overlay mark of semiconductor device and semiconductor device including the overlay markSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1843US7221014B2DRAM devices having an increased density layoutSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·1 cites·20 claims
- 1943US2005089776A1Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the sameFiled 2004·Application pending·0 cites
- 2042US2008052660A1Method of correcting a designed pattern of a maskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2139US2006284259A1Semiconductor device and method of manufacturing the sameLEE JUNG-HYEON·Filed 2006·Application pending·0 cites
- 2238US2004212809A1Beam delivery methods, and systems, and wafer edge exposure apparatus delivering a plurality of laser beamsFiled 2004·Application pending·0 cites
- 2337US6492701B1Semiconductor device having anti-reflective cap and spacer, method of manufacturing the same, and method of manufacturing photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Dec 10, 2002·5 cites·12 claims
- 2437US2004009436A1Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymerSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 2535US2006073670A1Method of manufacturing a semiconductor deviceBAE YONG-KUG·Filed 2005·Application pending·0 cites
- 2632US2006115954A1Methods of manufacturing a capacitor and a semiconductor deviceSHIM WOO-SEOK·Filed 2005·Application pending·0 cites
- 2729US6218204B1Capacitance compensation for topological measurements in a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Apr 17, 2001·2 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →