Inventor · disambiguated record
Kazuyuki Ikenaga
Also filed as: IKENAGA KAZUYUKI
26 granted patents·8 pending applications·81 citations·filing 2001–2024
94Inventor score
Top patents by PatentIndex Score
34 records- 0195US12191121B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Jan 7, 2025·2 cites·4 claims
- 0295US11664233B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2021·Granted May 30, 2023·2 cites·8 claims
- 0383US11257661B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Feb 22, 2022·3 cites·7 claims
- 0483US6716301B2Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probeHITACHI LTD·Filed 2001·Granted Apr 6, 2004·25 cites·23 claims
- 0582US12494348B2Plasma processing apparatus and member of plasma processing chamberHITACHI HIGH TECH CORP·Filed 2023·Granted Dec 9, 2025·0 cites·2 claims
- 0678US6911157B2Plasma processing method and apparatus using dynamic sensing of a plasma environmentHITACHI LTD·Filed 2003·Granted Jun 28, 2005·17 cites·11 claims
- 0777US2025218846A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2024·Application pending·0 cites
- 0875US8680466B2Electron microscope, and specimen holding methodKANNO SEIICHIRO·Filed 2009·Granted Mar 25, 2014·5 cites·10 claims
- 0974US7601241B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2004·Granted Oct 13, 2009·9 cites·11 claims
- 1073US6850012B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Feb 1, 2005·10 cites·10 claims
- 1171US12112925B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Oct 8, 2024·0 cites·5 claims
- 1268US8006340B2Cleaning apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Aug 30, 2011·2 cites·9 claims
- 1365US7771607B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2007·Granted Aug 10, 2010·1 cites·1 claims
- 1464US11107694B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 31, 2021·0 cites·1 claims
- 1563US11315792B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted Apr 26, 2022·0 cites·6 claims
- 1661US2024047258A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 1760US10395935B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 27, 2019·0 cites·3 claims
- 1860US2019326101A1Plasma processing apparatus and member of plasma processing chamberHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 1959US12266508B2Plasma processing apparatus and method for venting a processing chamber to atmosphereHITACHI HIGH TECH CORP·Filed 2020·Granted Apr 1, 2025·0 cites·2 claims
- 2058US12437978B2Cleaning method of film layer in the plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 7, 2025·0 cites·6 claims
- 2156US6793768B2Plasma-assisted processing apparatusHITACHI LTD·Filed 2002·Granted Sep 21, 2004·5 cites·2 claims
- 2255US10886106B2Plasma processing apparatus and method for venting a processing chamber to atmosphereHITACHI HIGH TECH CORP·Filed 2018·Granted Jan 5, 2021·0 cites·9 claims
- 2355US10490412B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2016·Granted Nov 26, 2019·0 cites·2 claims
- 2455US9941133B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 10, 2018·0 cites·6 claims
- 2555US2025357087A1Manufacturing method of inner member of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 2652US11424108B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 23, 2022·0 cites·4 claims
- 2751US11987880B2Manufacturing method and inspection method of interior member of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted May 21, 2024·0 cites·16 claims
- 2846US8024831B2Cleaning methodHITACHI HIGH TECH CORP·Filed 2010·Granted Sep 27, 2011·0 cites·2 claims
- 2943US2021241998A1Plasma processing apparatus and inner component of plasma processing apparatus and manufacturing method of inner component of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 3042US2004149384A1Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probeFiled 2003·Application pending·0 cites
- 3141US9607874B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Mar 28, 2017·0 cites·4 claims
- 3239US2002029851A1Plasma processing method and apparatus using dynamic sensing of a plasma environmentFiled 2001·Application pending·0 cites
- 3333US2015371825A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 3430USD1094319SUpper chamber for a plasma processing deviceHITACHI HIGH TECH CORP·Filed 2022·Granted Sep 23, 2025·0 cites·1 claims
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