Inventor · disambiguated record
Goji Wakamatsu
Also filed as: WAKAMATSU GOJI
13 granted patents·3 pending applications·16 citations·filing 2011–2019
85Inventor score
Top patents by PatentIndex Score
16 records- 0184US9581905B2Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compoundJSR CORP·Filed 2015·Granted Feb 28, 2017·6 cites·12 claims
- 0281US10078265B2Pattern-forming method, resin, and compositionJSR CORP·Filed 2016·Granted Sep 18, 2018·3 cites·20 claims
- 0373US9412593B2Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming methodJSR CORP·Filed 2015·Granted Aug 9, 2016·2 cites·17 claims
- 0471US9958781B2Method for film formation, and pattern-forming methodJSR CORP·Filed 2016·Granted May 1, 2018·2 cites·12 claims
- 0570US9620378B1Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Apr 11, 2017·2 cites·15 claims
- 0665US11243468B2Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production methodJSR CORP·Filed 2019·Granted Feb 8, 2022·1 cites·17 claims
- 0756US10423083B2Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrateJSR CORP·Filed 2017·Granted Sep 24, 2019·0 cites·14 claims
- 0850US2013213894A1Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrateHARADA KENTARO·Filed 2012·Application pending·0 cites
- 0949US10520814B2Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrateJSR CORP·Filed 2017·Granted Dec 31, 2019·0 cites·13 claims
- 1046US11320739B2Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrateJSR CORP·Filed 2018·Granted May 3, 2022·0 cites·20 claims
- 1144US11126084B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compoundJSR CORP·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 1244US9259668B2Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrateJSR CORP·Filed 2013·Granted Feb 16, 2016·0 cites·12 claims
- 1335US8883023B2Method for forming patternJSR CORP·Filed 2012·Granted Nov 11, 2014·0 cites·3 claims
- 1434US2017137663A9Composition for resist underlayer film formation, resist underlayer film, and production method of patterned substrateJSR CORP·Filed 2016·Application pending·0 cites
- 1533US10053539B2Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Aug 21, 2018·0 cites·14 claims
- 1633US2011223544A1Resist pattern coating agent and resist pattern forming method using the sameJSR CORP·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →