Inventor · disambiguated record
Makiko Irie
Also filed as: IRIE MAKIKO
20 granted patents·6 pending applications·55 citations·filing 2005–2018
92Inventor score
Files withTOKYO OHKA KOGYO CO LTD16IRIE MAKIKO5MATSUZAWA NOBUYUKI1MIMURA TAKEYOSHI1UTSUMI YOSHIYUKI1
Top patents by PatentIndex Score
26 records- 0185US8187789B2Positive resist composition and method of forming resist patternYONEMURA KOJI·Filed 2009·Granted May 29, 2012·9 cites·7 claims
- 0285US7494762B2Positive resist composition for immersion lithography and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Feb 24, 2009·8 cites·8 claims
- 0384US8795947B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·4 cites·2 claims
- 0483US8263307B2Positive resist composition and method of forming resist patternIRIE MAKIKO·Filed 2009·Granted Sep 11, 2012·7 cites·6 claims
- 0579US8278022B2Positive resist composition and method of forming resist patternMIMURA TAKEYOSHI·Filed 2009·Granted Oct 2, 2012·7 cites·5 claims
- 0669US9448478B2Chemically amplified positive-type photosensitive resin composition for thick-film applicationTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Sep 20, 2016·2 cites·6 claims
- 0769US9323152B2Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Apr 26, 2016·1 cites·4 claims
- 0862US8021824B2Polymer compound, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Sep 20, 2011·1 cites·8 claims
- 0961US7799507B2Positive resist composition for immersion lithography and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Sep 21, 2010·6 cites·16 claims
- 1055US7781144B2Positive resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Aug 24, 2010·5 cites·4 claims
- 1154US8192914B2Resist composition for immersion exposure and method of forming resist patternIRIE MAKIKO·Filed 2006·Granted Jun 5, 2012·4 cites·4 claims
- 1251US8574813B2Resist composition for immersion exposure and method of forming resist patternIRIE MAKIKO·Filed 2012·Granted Nov 5, 2013·1 cites·10 claims
- 1348US9372403B2Chemically amplified photosensitive resin composition and method for producing resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 21, 2016·0 cites·7 claims
- 1446US8916332B2Resist composition, method of forming resist pattern, and polymeric compoundIRIE MAKIKO·Filed 2012·Granted Dec 23, 2014·0 cites·3 claims
- 1546US7858288B2Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Dec 28, 2010·0 cites·10 claims
- 1645US8394569B2Resist composition for immersion lithography and method for forming resist patternIRIE MAKIKO·Filed 2007·Granted Mar 12, 2013·0 cites·9 claims
- 1745US2009317741A1Compound, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 1845US2014316054A1Method of forming filmTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 1944US2010167178A1Oxime sulfonates and the use thereof as latent acidsYAMATO HITOSHI·Filed 2007·Application pending·0 cites
- 2042US2007298615A1Pattern forming method and method of manufacturing semiconductor devicesMATSUZAWA NOBUYUKI·Filed 2007·Application pending·0 cites
- 2138US9618842B2Resist composition and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2010·Granted Apr 11, 2017·0 cites·3 claims
- 2238US2018259850A1Method for forming patterned cured film, photosensitive composition, dry film, and method for producing plated shaped articleTOKYO OHKA KOGYO CO LTD·Filed 2018·Application pending·0 cites
- 2337US2010266955A1Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 2435US10261415B2Chemically amplified positive-type photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Apr 16, 2019·0 cites·13 claims
- 2530US8029968B2Positive resist composition and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 4, 2011·0 cites·10 claims
- 2629US7858286B2Positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Dec 28, 2010·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →