Inventor · disambiguated record
Theodore Paxton
Also filed as: PAXTON THEODORE A · PAXTON THEODORE ALLEN
10 granted patents·2 pending applications·123 citations·filing 2003–2011
88Inventor score
Top patents by PatentIndex Score
12 records- 0192US6873938B1Adaptive lithographic critical dimension enhancementASML NETHERLANDS BV·Filed 2003·Granted Mar 29, 2005·61 cites·30 claims
- 0290US7781149B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2006·Granted Aug 24, 2010·16 cites·33 claims
- 0382US7738075B2Lithographic attribute enhancementASML NETHERLANDS BV·Filed 2005·Granted Jun 15, 2010·7 cites·29 claims
- 0480US7906270B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Mar 15, 2011·6 cites·31 claims
- 0577US6872014B1Method for developing a photoresist patternASML NETHERLANDS BV·Filed 2003·Granted Mar 29, 2005·17 cites·21 claims
- 0668US7274429B2Integrated lithographic fabrication clusterASML NETHERLANDS BV·Filed 2003·Granted Sep 25, 2007·11 cites·29 claims
- 0761US8937705B2Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting deviceTEL WIM TJIBBO·Filed 2009·Granted Jan 20, 2015·1 cites·26 claims
- 0848US7019268B2Wafer processing apparatus and method of useASML NETHERLANDS BV·Filed 2004·Granted Mar 28, 2006·2 cites·23 claims
- 0948US6958476B2Methods to improve resolution of cross sectioned features created using an ion beamASML NETHERLANDS BV·Filed 2003·Granted Oct 25, 2005·2 cites·30 claims
- 1048US2011244401A1Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 1148US2007046917A1Lithographic apparatus and device manufacturing method that compensates for reticle induced CDUASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1247US7981595B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Jul 19, 2011·0 cites·32 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →