Inventor · disambiguated record
Michael Lauter
Also filed as: LAUTER MICHAEL
24 granted patents·14 pending applications·31 citations·filing 2002–2025
92Inventor score
Top patents by PatentIndex Score
38 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0377US10647900B2Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitorsBASF SE·Filed 2014·Granted May 12, 2020·3 cites·16 claims
- 0475US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0575US9777192B2Chemical mechanical polishing (CMP) composition comprising a proteinBASF SE·Filed 2013·Granted Oct 3, 2017·3 cites·16 claims
- 0673US2025283223A1Compositions and methods for tungsten etching inhibitionBASF SE·Filed 2025·Application pending·0 cites
- 0772US12351737B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Granted Jul 8, 2025·0 cites·12 claims
- 0871US8980750B2Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate saltBASF SE·Filed 2013·Granted Mar 17, 2015·2 cites·14 claims
- 0969US2024002698A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Application pending·0 cites
- 1059US11168239B2Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitorsBASF SE·Filed 2020·Granted Nov 9, 2021·0 cites·17 claims
- 1159US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 1257US2022372632A1Compositions and methods for tungsten etching inhibitionBASF SE·Filed 2020·Application pending·0 cites
- 1355US9255214B2Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particlesLAUTER MICHAEL·Filed 2010·Granted Feb 9, 2016·1 cites·19 claims
- 1455US2022049125A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1555US2025215266A1Compositions and methods for tungsten etching inhibitionBASF SE·Filed 2023·Application pending·0 cites
- 1652US2025305152A1Composition, its use and a process for cleaning substrates comprising cobalt and copperBASF SE·Filed 2023·Application pending·0 cites
- 1749US12378439B2Compositions for tungsten etching inhibitionBASF SE·Filed 2020·Granted Aug 5, 2025·0 cites·12 claims
- 1849US2008289362A1Process and apparatus for low-temperature air fractionationLOCHNER STEFAN·Filed 2008·Application pending·0 cites
- 1947US10570316B2Chemical mechanical polishing (CMP) compositionBASF SE·Filed 2015·Granted Feb 25, 2020·0 cites·20 claims
- 2047US2016280963A1Raspberry-type metal oxide nanostructures coated with ceo2 nanoparticles for chemical mechanical planarization (cmp)BASF SE·Filed 2016·Application pending·0 cites
- 2146US11725117B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Granted Aug 15, 2023·0 cites·17 claims
- 2246US6662594B2Apparatus and process for producing gaseous oxygen under elevated pressureLINDE AG·Filed 2002·Granted Dec 16, 2003·6 cites·19 claims
- 2345US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 2443US9487674B2Chemical mechanical polishing (CMP) composition comprising a glycosideLI YUZHUO·Filed 2012·Granted Nov 8, 2016·0 cites·15 claims
- 2542US2014011362A1Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid groupBASF SE·Filed 2013·Application pending·0 cites
- 2641US10865361B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2017·Granted Dec 15, 2020·0 cites·20 claims
- 2741US2016160083A1Cmp composition comprising abrasive particles containing ceriaBASF SE·Filed 2014·Application pending·0 cites
- 2840US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 2940US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 3040US6708523B2Process and apparatus for producing high-purity nitrogen by low-temperature fractionation of airLINDE AG·Filed 2002·Granted Mar 23, 2004·6 cites·21 claims
- 3139US10844325B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·13 claims
- 3238US9263296B2Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitorsNOLLER BASTIAN·Filed 2012·Granted Feb 16, 2016·0 cites·25 claims
- 3337US2012077419A1Raspberry-type metal oxide nanostructures coated with ceo2 nanoparticles for chemical mechanical planarization (cmp)ZHANG ZHIHUA·Filed 2010·Application pending·0 cites
- 3436US2020291267A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASFR SE·Filed 2017·Application pending·0 cites
- 3535US10844333B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·12 claims
- 3635US10407594B2Chemical mechanical polishing (CMP) composition comprising a polymeric polyamineNOLLER BASTIAN MARTEN·Filed 2012·Granted Sep 10, 2019·0 cites·12 claims
- 3732US2017166778A1Chemical mechanical polishing (cmp) composition comprising a poly(aminoacid)BASF SE·Filed 2015·Application pending·0 cites
- 3830US10227506B2Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germaniumBASF SE·Filed 2015·Granted Mar 12, 2019·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →