Inventor · disambiguated record
Ronald L. Rose
Also filed as: ROSE RONALD · ROSE RONALD L · ROSE RONALD LLOYD
11 granted patents·2 pending applications·1,598 citations·filing 1993–2011
94Inventor score
Top patents by PatentIndex Score
13 records- 0198US6379466B1Temperature controlled gas distribution plateAPPLIED MATERIALS INC·Filed 1994·Granted Apr 30, 2002·468 cites·2 claims
- 0298US6271148B1Method for improved remote microwave plasma source for use with substrate processing systemAPPLIED MATERIALS INC·Filed 1999·Granted Aug 7, 2001·647 cites·26 claims
- 0392US5326725AClamping ring and susceptor thereforAPPLIED MATERIALS INC·Filed 1993·Granted Jul 5, 1994·166 cites·13 claims
- 0490US7897525B2Methods and systems of transferring, docking and processing substratesARCHERS INC·Filed 2008·Granted Mar 1, 2011·21 cites·62 claims
- 0590US6223447B1Fastening device for a purge ringAPPLIED MATERIALS INC·Filed 2000·Granted May 1, 2001·50 cites·20 claims
- 0690US6206971B1Integrated temperature controlled exhaust and cold trap assemblyAPPLIED MATERIALS INC·Filed 1999·Granted Mar 27, 2001·90 cites·17 claims
- 0789US8367565B2Methods and systems of transferring, docking and processing substratesARCHERS INC·Filed 2010·Granted Feb 5, 2013·16 cites·52 claims
- 0884US8268734B2Methods and systems of transferring, docking and processing substratesLEI LAWRENCE CHUNG-LAI·Filed 2011·Granted Sep 18, 2012·7 cites·34 claims
- 0981US6517592B2Cold trap assemblyAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·21 cites·12 claims
- 1081US6026762AApparatus for improved remote microwave plasma source for use with substrate processing systemsAPPLIED MATERIALS INC·Filed 1997·Granted Feb 22, 2000·54 cites·28 claims
- 1176US5522937AWelded susceptor assemblyAPPLIED MATERIALS INC·Filed 1994·Granted Jun 4, 1996·58 cites·40 claims
- 1244US2010162954A1Integrated facility and process chamber for substrate processingLEI LAWRENCE CHUNG-LAI·Filed 2008·Application pending·0 cites
- 1335US2001042513A1Apparatus for improved remote microwave plasma source for use with substrate processing systemsFiled 2001·Application pending·0 cites
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