Inventor · disambiguated record
Kenji Harafuji
Also filed as: HARAFUJI KENJI
20 granted patents·2 pending applications·670 citations·filing 1990–2006
96Inventor score
Top patents by PatentIndex Score
22 records- 0195US5928528APlasma treatment method and plasma treatment systemMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Jul 27, 1999·190 cites·22 claims
- 0290US7160748B2Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Jan 9, 2007·13 cites·11 claims
- 0388US5057689AScanning electron microscope and a method of displaying cross sectional profiles using the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1990·Granted Oct 15, 1991·63 cites·10 claims
- 0486US6737684B1Bipolar transistor and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted May 18, 2004·40 cites·10 claims
- 0586US5182718AMethod and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or lightMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1990·Granted Jan 26, 1993·107 cites·24 claims
- 0682US6586774B2Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Jul 1, 2003·21 cites·6 claims
- 0777US6867112B1Method of fabricating nitride semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 15, 2005·17 cites·3 claims
- 0877US5332880AMethod and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 26, 1994·44 cites·19 claims
- 0970US6544869B1Method and apparatus for depositing semiconductor film and method for fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Apr 8, 2003·8 cites·8 claims
- 1069US6667185B2Method of fabricating nitride semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Dec 23, 2003·10 cites·7 claims
- 1166US5345145AMethod and apparatus for generating highly dense uniform plasma in a high frequency electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Sep 6, 1994·33 cites·22 claims
- 1265US6466597B1Semiconductor laser deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Oct 15, 2002·27 cites·21 claims
- 1365US4998020AElectron beam exposure evaluation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1990·Granted Mar 5, 1991·19 cites·6 claims
- 1460US5324388ADry etching method and dry etching apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jun 28, 1994·14 cites·10 claims
- 1559US5869402APlasma generating and processing method and apparatus thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Feb 9, 1999·14 cites·25 claims
- 1655US5259922ADrying etching methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1991·Granted Nov 9, 1993·25 cites·9 claims
- 1752US6921678B2Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Jul 26, 2005·2 cites·9 claims
- 1851US8686544B2Semiconductor deviceHARAFUJI KENJI·Filed 2006·Granted Apr 1, 2014·1 cites·14 claims
- 1946US5635021ADry etching MethodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Jun 3, 1997·13 cites·23 claims
- 2046US5424905APlasma generating method and apparatusMATSUSHITA ELECTRIC COMPANY LT·Filed 1993·Granted Jun 13, 1995·9 cites·18 claims
- 2146US2002195054A1Method and apparatus for depositing semiconductor film and method for fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Application pending·0 cites
- 2240US2001032588A1Semiconductor film deposition apparatusFiled 2001·Application pending·0 cites
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