Inventor · disambiguated record
Hongyu Yue
Also filed as: YUE HONGYU · YUE HONGYU H · YUE HONGYU HENRY
28 granted patents·15 pending applications·1,111 citations·filing 2000–2015
97Inventor score
Top patents by PatentIndex Score
43 records- 0198US9017933B2Method for integrating low-k dielectricsLIU JUNJUN·Filed 2011·Granted Apr 28, 2015·463 cites·21 claims
- 0295US8895942B2Dielectric treatment module using scanning IR radiation sourceLIU JUNJUN·Filed 2008·Granted Nov 25, 2014·44 cites·30 claims
- 0395US6852584B1Method of trimming a gate electrode structureTOKYO ELECTRON LTD·Filed 2004·Granted Feb 8, 2005·134 cites·34 claims
- 0494US6238937B1Determining endpoint in etching processes using principal components analysis of optical emission spectra with thresholdingADVANCED MICRO DEVICES INC·Filed 2000·Granted May 29, 2001·70 cites·42 claims
- 0593US6675137B1Method of data compression using principal components analysisADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 6, 2004·50 cites·40 claims
- 0692US6564114B1Determining endpoint in etching processes using real-time principal components analysis of optical emission spectraADVANCED MICRO DEVICES INC·Filed 2000·Granted May 13, 2003·49 cites·47 claims
- 0791US6582618B1Method of determining etch endpoint using principal components analysis of optical emission spectraADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 24, 2003·60 cites·20 claims
- 0888US6419846B1Determining endpoint in etching processes using principal components analysis of optical emission spectraADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 16, 2002·32 cites·42 claims
- 0986US7127358B2Method and system for run-to-run controlADVANCED MICRO DEVICES INC·Filed 2004·Granted Oct 24, 2006·41 cites·51 claims
- 1083US7213478B2Method for automatic configuration of processing systemTOKYO ELECTRON LTD·Filed 2004·Granted May 8, 2007·41 cites·36 claims
- 1181US7844559B2Method and system for predicting process performance using material processing tool and sensor dataTOKYO ELECTRON LTD·Filed 2008·Granted Nov 30, 2010·7 cites·19 claims
- 1279US8980651B2Overlay measurement for a double patterningYUE HONGYU HENRY·Filed 2011·Granted Mar 17, 2015·4 cites·18 claims
- 1378US6893975B1System and method for etching a maskTOKYO ELECTRON LTD·Filed 2004·Granted May 17, 2005·17 cites·17 claims
- 1477US7167766B2Controlling a material processing tool and performance dataTOKYO ELECTRON LTD·Filed 2003·Granted Jan 23, 2007·24 cites·33 claims
- 1575US8048326B2Method and apparatus for determining an etch property using an endpoint signalTOKYO ELECTRON LTD·Filed 2003·Granted Nov 1, 2011·18 cites·21 claims
- 1674US6825920B2Method and system of determining chamber seasoning condition by optical emissionTOKYO ELECTRON LTD·Filed 2003·Granted Nov 30, 2004·15 cites·41 claims
- 1772US8242460B2Ultraviolet treatment apparatusYUE HONGYU·Filed 2011·Granted Aug 14, 2012·3 cites·20 claims
- 1867US9502209B2Multi-step location specific process for substrate edge profile correction for GCIB systemTEL EPION INC·Filed 2015·Granted Nov 22, 2016·1 cites·9 claims
- 1967US8916055B2Method and device for controlling pattern and structure formation by an electric fieldBRCKA JOZEF·Filed 2012·Granted Dec 23, 2014·1 cites·35 claims
- 2064US7972483B2Method of fault detection for material process systemTOKYO ELECTRON LTD·Filed 2002·Granted Jul 5, 2011·10 cites·22 claims
- 2163US7297560B2Method and apparatus for detecting endpointTOKYO ELECTRON LTD·Filed 2003·Granted Nov 20, 2007·8 cites·32 claims
- 2262US7297287B2Method and apparatus for endpoint detection using partial least squaresTOKYO ELECTRON LTD·Filed 2002·Granted Nov 20, 2007·10 cites·26 claims
- 2358US9105443B2Multi-step location specific process for substrate edge profile correction for GCIB systemTEL EPION INC·Filed 2014·Granted Aug 11, 2015·0 cites·11 claims
- 2457US2015152556A1Method and device for controlling pattern and structure formation by an electric fieldTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2555US7713760B2Process system health index and method of using the sameTOKYO ELECTRON LTD·Filed 2004·Granted May 11, 2010·5 cites·11 claims
- 2653US8530247B2Control of implant pattern critical dimensions using STI step height offsetREID BRIAN DOUGLAS·Filed 2008·Granted Sep 10, 2013·2 cites·20 claims
- 2752US7430496B2Method and apparatus for using a pressure control system to monitor a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Sep 30, 2008·2 cites·9 claims
- 2848US2010068897A1Dielectric treatment platform for dielectric film deposition and curingTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2948US2005221619A1System and method for etching a maskTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3048US2010065758A1Dielectric material treatment system and method of operatingTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3148US2010067886A1Ir laser optics system for dielectric treatment moduleTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3247US7211196B2Method and system of discriminating substrate typeTOKYO ELECTRON LTD·Filed 2004·Granted May 1, 2007·0 cites·8 claims
- 3347US2009311634A1Method of double patterning using sacrificial structureTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3447US2007111338A1Method of controlling trimming of a gate electrode structureTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3540US2005252884A1Method and system for predicting process performance using material processing tool and sensor dataTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3640US2005218114A1Method and system for performing a chemical oxide removal processTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3740US2005218113A1Method and system for adjusting a chemical oxide removal process using partial pressureTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3839US2005221513A1Method of controlling trimming of a gate electrode structureTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3938US2005227494A1Processing system and method for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 4038US2012225568A1Annealing method and annealing apparatusIZAWA YUSAKU·Filed 2012·Application pending·0 cites
- 4137US2008248412A1Supervisory etch cd controlSTUBER JOHN DOUGLAS·Filed 2007·Application pending·0 cites
- 4236US2005118812A1Method of detecting, identifying and correcting process performanceTOKYO ELECRON LTD·Filed 2002·Application pending·0 cites
- 4332US8444848B2Electrochemical substrate slicing using electromagnetic wave excitationYUE HONGYU H·Filed 2010·Granted May 21, 2013·0 cites·19 claims
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