Inventor · disambiguated record
Daniel L. Brors
Also filed as: BRORS DANIEL · BRORS DANIEL L
18 granted patents·5 pending applications·1,479 citations·filing 1975–2013
96Inventor score
Top patents by PatentIndex Score
23 records- 0198US6321680B2Vertical plasma enhanced process apparatus and methodTORREX EQUIPMENT CORP·Filed 1999·Granted Nov 27, 2001·526 cites·4 claims
- 0295US4565157AMethod and apparatus for deposition of tungsten silicidesGENUS INC·Filed 1983·Granted Jan 21, 1986·110 cites·25 claims
- 0395US4169031AMagnetron sputter cathode assemblyPOLYOHM INC·Filed 1978·Granted Sep 25, 1979·79 cites·14 claims
- 0494US5551985AMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1995·Granted Sep 3, 1996·135 cites·9 claims
- 0592US6352593B1Mini-batch process chamberTORREX EQUIPMENT CORP·Filed 1997·Granted Mar 5, 2002·118 cites·20 claims
- 0692US4629635AProcess for depositing a low resistivity tungsten silicon composite film on a substrateGENUS INC·Filed 1984·Granted Dec 16, 1986·90 cites·6 claims
- 0790US4796562ARapid thermal cvd apparatusVARIAN ASSOCIATES·Filed 1987·Granted Jan 10, 1989·101 cites·25 claims
- 0883US6352594B2Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectorsTORREX·Filed 1999·Granted Mar 5, 2002·80 cites·12 claims
- 0983US4851295ALow resistivity tungsten silicon composite filmGENUS INC·Filed 1986·Granted Jul 25, 1989·59 cites·4 claims
- 1070USRE36957EMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1998·Granted Nov 21, 2000·28 cites·10 claims
- 1170US4012766ASemiconductor package and method of manufacture thereofWESTERN DIGITAL CORP·Filed 1975·Granted Mar 15, 1977·39 cites·13 claims
- 1266US6287635B1High rate silicon deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Sep 11, 2001·30 cites·19 claims
- 1362US5291030AOptoelectronic detector for chemical reactionsTORREX EQUIPMENT CORP·Filed 1992·Granted Mar 1, 1994·24 cites·10 claims
- 1460US6780464B2Thermal gradient enhanced CVD deposition at low pressureTORREX EQUIPMENT·Filed 2001·Granted Aug 24, 2004·8 cites·9 claims
- 1560US6506691B2High rate silicon nitride deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Jan 14, 2003·22 cites·12 claims
- 1655US2009188790A1Concentric hollow cathode magnetron sputter source4D S PTY LTD·Filed 2009·Application pending·0 cites
- 1750US4920908AMethod and apparatus for deposition of tungsten silicidesGENUS INC·Filed 1989·Granted May 1, 1990·13 cites·1 claims
- 1843US4539278AMask structure for X-ray lithography and method for making sameEATON CORP·Filed 1984·Granted Sep 3, 1985·10 cites·23 claims
- 1943US2005013937A1Thermal gradient enhanced CVD deposition at low pressureFiled 2004·Application pending·0 cites
- 2042US2016181066A1Laminated materials, methods and apparatus for making same, and uses thereofNITRIDE SOLUTIONS INC·Filed 2013·Application pending·0 cites
- 2139US6235652B1High rate silicon dioxide deposition at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted May 22, 2001·7 cites·15 claims
- 2237US2014227527A1Inorganic materials, methods and apparatus for making same, and uses thereofNITRIDE SOLUTIONS INC·Filed 2012·Application pending·0 cites
- 2336US2003049372A1High rate deposition at low pressures in a small batch reactorFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →