Inventor · disambiguated record
Atsushi Sekiguchi
Also filed as: SEKIGUCHI ATSUSHI
41 granted patents·7 pending applications·1,858 citations·filing 1986–2022
98Inventor score
Files withANELVA CORP19DAINIPPON PRINTING CO LTD11HONDA MOTOR CO LTD6FUJITSU LTD2HITACHI HIGH TECH CORP2
Top patents by PatentIndex Score
48 records- 0198US7618750B2Hologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 2006·Granted Nov 17, 2009·101 cites·24 claims
- 0298US7579119B2Hologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 2007·Granted Aug 25, 2009·105 cites·3 claims
- 0398US7479354B2Hologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 2007·Granted Jan 20, 2009·104 cites·4 claims
- 0498US6340540B1Hologram recording sheet holographic optical element using said sheet and its production processDAINIPPON PRINTING CO LTD·Filed 2000·Granted Jan 22, 2002·114 cites·11 claims
- 0598US6127066AHologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 1997·Granted Oct 3, 2000·175 cites·10 claims
- 0697US5891349APlasma enhanced CVD apparatus and process, and dry etching apparatus and processANELVA CORP·Filed 1996·Granted Apr 6, 1999·308 cites·36 claims
- 0796US5855685APlasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD methodANELVA CORP·Filed 1996·Granted Jan 5, 1999·220 cites·27 claims
- 0895US7132200B1Hologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 1993·Granted Nov 7, 2006·118 cites·13 claims
- 0990US6080446AMethod of depositing titanium nitride thin film and CVD deposition apparatusANELVA CORP·Filed 1998·Granted Jun 27, 2000·106 cites·5 claims
- 1090US5453338AHologram and method of and apparatus for producing the sameDAINIPPON PRINTING CO LTD·Filed 1993·Granted Sep 26, 1995·69 cites·16 claims
- 1188US5721021AMethod of depositing titanium-containing conductive thin filmANELVA CORP·Filed 1996·Granted Feb 24, 1998·62 cites·14 claims
- 1282US5993679AMethod of cleaning metallic films built up within thin film deposition apparatusANELVA CORP·Filed 1998·Granted Nov 30, 1999·48 cites·8 claims
- 1381US4919783AApparatus for processing an object by gas plasma with a reduced damageANELVA CORP·Filed 1987·Granted Apr 24, 1990·30 cites·17 claims
- 1480US7727680B2Hologram recording sheet, holographic optical element using said sheet, and its production processDAINIPPON PRINTING CO LTD·Filed 2006·Granted Jun 1, 2010·3 cites·10 claims
- 1574US4664747ASurface processing apparatus utilizing local thermal equilibrium plasma and method of using sameANELVA CORP·Filed 1986·Granted May 12, 1987·45 cites·15 claims
- 1673US6468604B1Method for manufacturing a titanium nitride thin filmANELVA CORP·Filed 2000·Granted Oct 22, 2002·10 cites·20 claims
- 1770US5594280AMethod of forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling meansANELVA CORP·Filed 1993·Granted Jan 14, 1997·38 cites·6 claims
- 1869US5672385ATitanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gasANELVA CORP·Filed 1996·Granted Sep 30, 1997·33 cites·13 claims
- 1964US5744377AMethod for forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling meansANELVA CORP·Filed 1995·Granted Apr 28, 1998·25 cites·15 claims
- 2059US6726954B2Method and system for forming copper thin filmANELVA CORP·Filed 2001·Granted Apr 27, 2004·6 cites·19 claims
- 2159US5366766AMethod of manufacturing thin film and thin film deviceJAPAN RES DEV CORP·Filed 1992·Granted Nov 22, 1994·18 cites·6 claims
- 2259US2009106038A1Information system including management server and support serverFUJITSU LTD·Filed 2008·Application pending·0 cites
- 2358US6471781B1Method of depositing titanium nitride thin film and CVD deposition apparatusANELVA CORP·Filed 1999·Granted Oct 29, 2002·21 cites·7 claims
- 2456US6387444B1Single substrate processing CVD procedure for depositing a metal film using first and second CVD processes in first and second process chambersANELVA CORP·Filed 2000·Granted May 14, 2002·2 cites·8 claims
- 2555US6562219B2Method for the formation of copper wiring filmsANELVA CORP·Filed 2001·Granted May 13, 2003·7 cites·12 claims
- 2655US5958632AMethod of making mask pattern utilizing sizing dependent on mask material and mask formed through the methodSONY CORP·Filed 1998·Granted Sep 28, 1999·14 cites·10 claims
- 2754US11176948B2Agent device, agent presentation method, and storage mediumHONDA MOTOR CO LTD·Filed 2019·Granted Nov 16, 2021·0 cites·12 claims
- 2854US11014508B2Communication support system, communication support method, and storage mediumHONDA MOTOR CO LTD·Filed 2019·Granted May 25, 2021·0 cites·12 claims
- 2953US10994612B2Agent system, agent control method, and storage mediumHONDA MOTOR CO LTD·Filed 2019·Granted May 4, 2021·0 cites·4 claims
- 3053US2009110165A1Arrival call status management system, management device, management method and storage mediumFUJITSU LTD·Filed 2008·Application pending·0 cites
- 3152US4981103AApparatus for forming a metal thin film utilizing temperature controlling meansANELVA CORP·Filed 1989·Granted Jan 1, 1991·16 cites·11 claims
- 3252US4963423AMethod for forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling meansANELVA CORP·Filed 1988·Granted Oct 16, 1990·15 cites·3 claims
- 3351US5985490AHologram and method of and apparatus for producing the sameDAINIPPON PRINTING CO LTD·Filed 1997·Granted Nov 16, 1999·12 cites·13 claims
- 3449US6887522B2Method for forming a copper thin filmANELVA CORP·Filed 2002·Granted May 3, 2005·2 cites·40 claims
- 3547US12051574B2Wafer processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 30, 2024·0 cites·4 claims
- 3647US11875978B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Jan 16, 2024·0 cites·15 claims
- 3747US2022381081A1Mobile body control system, mobile body control method, and recording mediumHONDA MOTOR CO LTD·Filed 2022·Application pending·0 cites
- 3845US11195700B2Etching apparatusCANON ANELVA CORP·Filed 2014·Granted Dec 7, 2021·0 cites·23 claims
- 3945US2002015791A1Method and manufacturing device for manufacturing a titanium nitride thin filmFiled 2001·Application pending·0 cites
- 4044US11798552B2Agent device, agent control method, and programHONDA MOTOR CO LTD·Filed 2018·Granted Oct 24, 2023·0 cites·9 claims
- 4144US5376628AMethod of improving or producing oxide superconductorANELVA CORP·Filed 1992·Granted Dec 27, 1994·10 cites·16 claims
- 4244US2020133630A1Control apparatus, agent apparatus, and computer readable storage mediumHONDA MOTOR CO LTD·Filed 2019·Application pending·0 cites
- 4342US5660954AHologram and method of and apparatus for producing the sameDAINIPPON PRINTING CO LTD·Filed 1995·Granted Aug 26, 1997·8 cites·14 claims
- 4440US6291109B1Hologram and method of and apparatus for producing the sameDAINIPPON PRINTING CO LTD·Filed 1999·Granted Sep 18, 2001·7 cites·4 claims
- 4539US6433886B1Image forming method and image forming apparatusKONISHIROKU PHOTO IND·Filed 1999·Granted Aug 13, 2002·6 cites·9 claims
- 4639US2001006701A1CVD apparatus and CVD method for copper depositionFiled 2001·Application pending·0 cites
- 4735US2007197162A1Communication relay apparatus, communication relay method, and computer productKOIZUMI YOSHIHARU·Filed 2003·Application pending·0 cites
- 4828US10685815B2Plasma processing apparatus and device manufacturing methodMATSUHASHI RYO·Filed 2010·Granted Jun 16, 2020·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →