Inventor · disambiguated record
Kwok Manus Wong
Also filed as: WONG KWOK M · WONG KWOK MANUS
12 granted patents·1 pending application·573 citations·filing 2000–2010
93Inventor score
Top patents by PatentIndex Score
13 records- 0197US6367412B1Porous ceramic liner for a plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Apr 9, 2002·135 cites·20 claims
- 0296US6478924B1Plasma chamber support having dual electrodesAPPLIED MATERIALS INC·Filed 2000·Granted Nov 12, 2002·124 cites·42 claims
- 0393US6494958B1Plasma chamber support with coupled electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Dec 17, 2002·74 cites·20 claims
- 0493US6391146B1Erosion resistant gas energizerAPPLIED MATERIALS INC·Filed 2000·Granted May 21, 2002·73 cites·50 claims
- 0591US7221553B2Substrate support having heat transfer systemAPPLIED MATERIALS INC·Filed 2003·Granted May 22, 2007·49 cites·23 claims
- 0688US8279577B2Substrate support having fluid channelNGUYEN ANDREW·Filed 2010·Granted Oct 2, 2012·8 cites·32 claims
- 0787US6673323B1Treatment of hazardous gases in effluentAPPLIED MATERIALS INC·Filed 2000·Granted Jan 6, 2004·47 cites·26 claims
- 0885US6726804B2RF power delivery for plasma processing using modulated power signalFiled 2001·Granted Apr 27, 2004·22 cites·7 claims
- 0984US7768765B2Substrate support having heat transfer systemAPPLIED MATERIALS INC·Filed 2007·Granted Aug 3, 2010·8 cites·32 claims
- 1078US6824748B2Heated catalytic treatment of an effluent gas from a substrate fabrication processAPPLIED MATERIALS INC·Filed 2001·Granted Nov 30, 2004·18 cites·23 claims
- 1177US6759624B2Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamberFiled 2002·Granted Jul 6, 2004·13 cites·17 claims
- 1250US6642489B2Method and apparatus for improving exhaust gas consumption in an exhaust conduitAPPLIED MATERIALS INC·Filed 2001·Granted Nov 4, 2003·2 cites·39 claims
- 1337US2003192646A1Plasma processing chamber having magnetic assembly and methodAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →