Inventor · disambiguated record
Shinya Okabe
Also filed as: OKABE SHINYA
11 granted patents·7 pending applications·134 citations·filing 1993–2025
85Inventor score
Files withTOKYO ELECTRON LTD10HITACHI LTD2NIPPON POWER GRAPHITE CO LTD2NIPPON COKE & ENGINEERING CO LTD1OKABE SHINYA1
Top patents by PatentIndex Score
18 records- 0190US5427102AActive noise cancellation apparatus in MRI apparatusHITACHI LTD·Filed 1994·Granted Jun 27, 1995·88 cites·25 claims
- 0286US11626290B2Method, device, and system for etching silicon oxide filmTOKYO ELECTRON LTD·Filed 2021·Granted Apr 11, 2023·1 cites·8 claims
- 0371US5343713AActive noise control apparatus for three-dimensional spaceHITACHI LTD·Filed 1993·Granted Sep 6, 1994·44 cites·37 claims
- 0466US2025354259A1Film formation apparatus, film formation method, and substrate support memberTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0565US11069512B2Film forming apparatus and gas injection member used thereforTOKYO ELECTRON LTD·Filed 2017·Granted Jul 20, 2021·1 cites·10 claims
- 0662US2025132167A1Film forming method and processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0761US2024337022A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0861US2024379377A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0953US2018315994A1Apparatus for manufacturing negative-electrode carbon material, and method for manufacturing negative-electrode carbon material using sameNIPPON POWER GRAPHITE CO LTD·Filed 2018·Application pending·0 cites
- 1052US10044024B2Apparatus for manufacturing negative-electrode carbon material, and method for manufacturing negative-electrode carbon material using sameNIPPON POWER GRAPHITE CO LTD·Filed 2017·Granted Aug 7, 2018·0 cites·3 claims
- 1150US2015303447A1Apparatus for manufacturing negative-electrode carbon material, and method for manufacturing negative-electrode carbon material using sameNIPPON COKE & ENGINEERING CO LTD·Filed 2013·Application pending·0 cites
- 1249US8906471B2Method of depositing metallic film by plasma CVD and storage mediumOKABE SHINYA·Filed 2009·Granted Dec 9, 2014·0 cites·8 claims
- 1348US9133548B2TiN film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Sep 15, 2015·0 cites·17 claims
- 1445US10731248B2Vacuum processing apparatus and operation method thereofTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·0 cites·5 claims
- 1540US10319585B2Film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·5 claims
- 1638US10738374B2Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 11, 2020·0 cites·3 claims
- 1734US2005257747A1Worktable device, film formation apparatus, and film formation method for semiconductor processWAKABAYASHI SATOSHI·Filed 2005·Application pending·0 cites
- 1833US9312532B2Negative electrode material for lithium ion secondary batteries, and method for producing sameUMENO TATSUO·Filed 2011·Granted Apr 12, 2016·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →