Inventor · disambiguated record
Toshihiko Orihara
Also filed as: ORIHARA TOSHIHIKO
16 granted patents·1 pending application·22 citations·filing 2012–2024
89Inventor score
Top patents by PatentIndex Score
17 records- 0192US9195131B2Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the sameHOYA CORP·Filed 2012·Granted Nov 24, 2015·7 cites·16 claims
- 0291US10001699B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Jun 19, 2018·6 cites·14 claims
- 0381US9897909B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Feb 20, 2018·2 cites·8 claims
- 0475US9383637B2Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Jul 5, 2016·3 cites·22 claims
- 0575US9348217B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted May 24, 2016·2 cites·15 claims
- 0674US9494851B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted Nov 15, 2016·2 cites·30 claims
- 0767US2025019289A1Titania-silica glass body with high quality polishing characteristicsCORNING INC·Filed 2024·Application pending·0 cites
- 0865US10620527B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2019·Granted Apr 14, 2020·0 cites·20 claims
- 0960US10429728B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2017·Granted Oct 1, 2019·0 cites·21 claims
- 1060US10295900B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2018·Granted May 21, 2019·0 cites·26 claims
- 1160US9581895B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Feb 28, 2017·0 cites·26 claims
- 1258US9798050B2Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Oct 24, 2017·0 cites·14 claims
- 1357US10175394B2Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jan 8, 2019·0 cites·9 claims
- 1457US10025176B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 1556US9488904B2Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the sameHOYA CORP·Filed 2015·Granted Nov 8, 2016·0 cites·16 claims
- 1646US10481488B2Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication methodHOYA CORP·Filed 2013·Granted Nov 19, 2019·0 cites·19 claims
- 1745US9507254B2Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Nov 29, 2016·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →