Inventor · disambiguated record
Naruhiko Kaji
Also filed as: KAJI NARUHIKO
12 granted patents·4 pending applications·280 citations·filing 1995–2006
92Inventor score
Top patents by PatentIndex Score
16 records- 0189US6798038B2Manufacturing method of semiconductor device with filling insulating film into trenchTOSHIBA KK·Filed 2002·Granted Sep 28, 2004·43 cites·1 claims
- 0286US6164295ACVD apparatus with high throughput and cleaning method thereforTOSHIBA KK·Filed 1997·Granted Dec 26, 2000·79 cites·13 claims
- 0385US5571578AMethod for forming silicon oxide on a semiconductorTOHSIBA KK·Filed 1995·Granted Nov 5, 1996·64 cites·12 claims
- 0482US7371654B2Manufacturing method of semiconductor device with filling insulating film into trenchTOSHIBA KK·Filed 2006·Granted May 13, 2008·8 cites·8 claims
- 0569US6938638B2Gas circulating-processing apparatusTOSHIBA KK·Filed 2001·Granted Sep 6, 2005·13 cites·20 claims
- 0667US5632868AMethod and apparatus for generating ozone and methods of its useEBARA CORP·Filed 1995·Granted May 27, 1997·24 cites·1 claims
- 0757US6153509AMethod of manufacturing a semiconductor deviceTOSHIBA KK·Filed 1999·Granted Nov 28, 2000·22 cites·5 claims
- 0856US5792326AMethod and apparatus for generating ozone and methods of its useFiled 1997·Granted Aug 11, 1998·14 cites·5 claims
- 0950US6368977B1Semiconductor device manufacturing methodTOSHIBA KK·Filed 2000·Granted Apr 9, 2002·3 cites·7 claims
- 1044US5702673AOzone generating apparatusEBARA CORP·Filed 1996·Granted Dec 30, 1997·8 cites·4 claims
- 1143US7084077B2Method of fabricating multilayer interconnect wiring structure having low dielectric constant insulator film with enhanced adhesivityTOSHIBA KK·Filed 2004·Granted Aug 1, 2006·1 cites·24 claims
- 1242US2004173870A1Manufacturing method of semiconductor device with filling insulating film into trenchTOSHIBA KK·Filed 2004·Application pending·0 cites
- 1338US2004150075A1Semiconductor device with cupper wiring and method for manufacturing semiconductor deviceSEMICONDUCTOR LEADING EDGE TEC·Filed 2003·Application pending·0 cites
- 1438US2004188675A1Semiconductor device and method of manufacturing the sameSEMICONDUCTOR LEADING EDGE TEC·Filed 2004·Application pending·0 cites
- 1535US2005181576A1Method for forming inorganic porus filmSEMICONDUCTOR LEADING EDGE TEC·Filed 2003·Application pending·0 cites
- 1631US5794114AOzonizerEBARA CORP·Filed 1995·Granted Aug 11, 1998·1 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →