Inventor · disambiguated record
Woo Seock Cheong
Also filed as: CHEONG WOO SEOCK
11 granted patents·1 pending application·249 citations·filing 2000–2005
90Inventor score
Top patents by PatentIndex Score
12 records- 0192US6844259B2Method for forming contact plug in semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 18, 2005·77 cites·17 claims
- 0289US6521508B1Method of manufacturing a contact plug in a semiconductor device using selective epitaxial growth of silicon processHYUNDAI ELECTRONICS IND·Filed 2000·Granted Feb 18, 2003·100 cites·10 claims
- 0376US6818537B2Method of manufacturing a contact plug for a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Nov 16, 2004·20 cites·24 claims
- 0474US6605520B2Method of forming silicon-germanium filmHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 12, 2003·18 cites·34 claims
- 0569US6624065B2Method of fabricating a semiconductor device using a damascene metal gateHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Sep 23, 2003·16 cites·25 claims
- 0662US7497221B2Method for cleaning deposition chamberHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Mar 3, 2009·1 cites·6 claims
- 0759US6923869B2Device for deposition with chamber cleaner and method for cleaning the chamberHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Aug 2, 2005·5 cites·16 claims
- 0859US6478873B1Method of optimizing process of selective epitaxial growthHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 12, 2002·7 cites·5 claims
- 0955US6933228B2Method of manufacturing of contact plug in a contact hole on a silicon substrateHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 23, 2005·5 cites·25 claims
- 1050US7361229B2Device for deposition with chamber cleaner and method for cleaning chamberHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Apr 22, 2008·0 cites·18 claims
- 1136US6712903B2Mask for evaluating selective epitaxial growth processHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Mar 30, 2004·0 cites·45 claims
- 1234US2003068885A1Method of forming a contact plug for a semiconductor deviceFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →