Inventor · disambiguated record
Pushkara R. Varanasi
Also filed as: VARANASI PUSHKARA · VARANASI PUSHKARA R · VARANASI PUSHKARA RAO
82 granted patents·12 pending applications·887 citations·filing 1991–2025
99Inventor score
Top patents by PatentIndex Score
94 records- 0197US6949325B2Negative resist composition with fluorosulfonamide-containing polymerIBM·Filed 2003·Granted Sep 27, 2005·91 cites·27 claims
- 0295US6420503B1Norbornene sulfonamide polymersSUMITOMO BAKELITE CO·Filed 2000·Granted Jul 16, 2002·74 cites·20 claims
- 0394US5718845ATricyanovinyl substitution process for NLO polymersENICHEM SPA·Filed 1995·Granted Feb 17, 1998·71 cites·14 claims
- 0493US8343706B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameIBM·Filed 2010·Granted Jan 1, 2013·6 cites·26 claims
- 0593US7838200B2Photoresist compositions and method for multiple exposures with multiple layer resist systemsIBM·Filed 2009·Granted Nov 23, 2010·17 cites·23 claims
- 0693US5514799A1,1-vinyl substituted nonlinear optical materialsENICHEM SPA·Filed 1993·Granted May 7, 1996·53 cites·35 claims
- 0792US8709700B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Apr 29, 2014·4 cites·28 claims
- 0892US8658345B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Feb 25, 2014·3 cites·17 claims
- 0992US7838198B2Photoresist compositions and method for multiple exposures with multiple layer resist systemsIBM·Filed 2007·Granted Nov 23, 2010·14 cites·31 claims
- 1092US7335456B2Top coat material and use thereof in lithography processesIBM·Filed 2004·Granted Feb 26, 2008·37 cites·21 claims
- 1191US7320855B2Silicon containing TARC/barrier layerIBM·Filed 2004·Granted Jan 22, 2008·37 cites·13 claims
- 1290US8628910B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Jan 14, 2014·3 cites·26 claims
- 1390US6635401B2Resist compositions with polymers having 2-cyano acrylic monomerIBM·Filed 2001·Granted Oct 21, 2003·31 cites·16 claims
- 1489US8663901B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Mar 4, 2014·3 cites·26 claims
- 1589US8628909B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Jan 14, 2014·3 cites·26 claims
- 1689US8546062B2Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using sameHUANG WU-SONG·Filed 2011·Granted Oct 1, 2013·7 cites·16 claims
- 1789US8518630B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Aug 27, 2013·3 cites·28 claims
- 1889US8236476B2Multiple exposure photolithography methods and photoresist compositionsCHEN KUANG-JUNG·Filed 2008·Granted Aug 7, 2012·7 cites·4 claims
- 1988US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 2088US6627391B1Resist compositions containing lactone additivesIBM·Filed 2000·Granted Sep 30, 2003·30 cites·10 claims
- 2187US8293451B2Near-infrared absorbing film compositionsGLODDE MARTIN·Filed 2009·Granted Oct 23, 2012·8 cites·17 claims
- 2287US7563563B2Wet developable bottom antireflective coating composition and method for use thereofIBM·Filed 2006·Granted Jul 21, 2009·8 cites·1 claims
- 2385US8017303B2Ultra low post exposure bake photoresist materialsIBM·Filed 2009·Granted Sep 13, 2011·7 cites·32 claims
- 2483US6534239B2Resist compositions with polymers having pendant groups containing plural acid labile moietiesIBM·Filed 2001·Granted Mar 18, 2003·21 cites·23 claims
- 2582US7803521B2Photoresist compositions and process for multiple exposures with multiple layer photoresist systemsIBM·Filed 2007·Granted Sep 28, 2010·5 cites·27 claims
- 2682US6756180B2Cyclic olefin-based resist compositions having improved image stabilityIBM·Filed 2002·Granted Jun 29, 2004·19 cites·18 claims
- 2782US6251560B1Photoresist compositions with cyclic olefin polymers having lactone moietyIBM·Filed 2000·Granted Jun 26, 2001·20 cites·31 claims
- 2881US8568960B2Multiple exposure photolithography methodsCHEN KUANG-JUNG·Filed 2012·Granted Oct 29, 2013·2 cites·20 claims
- 2980US8097401B2Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using sameHUANG WU-SONG·Filed 2009·Granted Jan 17, 2012·4 cites·14 claims
- 3080US7217496B2Fluorinated photoresist materials with improved etch resistant propertiesIBM·Filed 2004·Granted May 15, 2007·15 cites·26 claims
- 3179US8182978B2Developable bottom antireflective coating compositions especially suitable for ion implant applicationsHUANG WU-SONG·Filed 2009·Granted May 22, 2012·4 cites·21 claims
- 3278US8617791B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Dec 31, 2013·4 cites·28 claims
- 3377US7807332B2Underlayer compositions containing heterocyclic aromatic structuresIBM·Filed 2008·Granted Oct 5, 2010·3 cites·5 claims
- 3477US7063931B2Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its useIBM·Filed 2004·Granted Jun 20, 2006·27 cites·19 claims
- 3577US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 3676US5395556ATricyanovinyl substitution process for NLO polymersENICHEM SPA·Filed 1991·Granted Mar 7, 1995·41 cites·20 claims
- 3774US8846296B2Photoresist compositionsCHEN KUANG-JUNG·Filed 2012·Granted Sep 30, 2014·1 cites·15 claims
- 3874US8623584B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Jan 7, 2014·3 cites·26 claims
- 3973US7651831B2Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its useIBM·Filed 2008·Granted Jan 26, 2010·2 cites·16 claims
- 4073US7544750B2Top antireflective coating composition with low refractive index at 193nm radiation wavelengthIBM·Filed 2005·Granted Jun 9, 2009·3 cites·20 claims
- 4173US2025196072A1Poly(quinoline) membranesENTEGRIS INC·Filed 2025·Application pending·0 cites
- 4272US12453942B2Porous poly (cyclic olefin) membranesENTEGRIS INC·Filed 2022·Granted Oct 28, 2025·0 cites·12 claims
- 4372US8536031B2Method of fabricating dual damascene structures using a multilevel multiple exposure patterning schemeARNOLD JOHN C·Filed 2010·Granted Sep 17, 2013·2 cites·11 claims
- 4472US7816068B2Underlayer compositions containing heterocyclic aromatic structuresIBM·Filed 2007·Granted Oct 19, 2010·2 cites·5 claims
- 4571US12101920B2Conductive polymeric layers for charge dissipationENTEGRIS INC·Filed 2023·Granted Sep 24, 2024·0 cites·17 claims
- 4671US7700262B2Top coat material and use thereof in lithography processesIBM·Filed 2008·Granted Apr 20, 2010·4 cites·20 claims
- 4771US6391521B1Resist compositions containing bulky anhydride additivesIBM·Filed 2000·Granted May 21, 2002·10 cites·22 claims
- 4870US6372406B1Deactivated aromatic amines as additives in acid-catalyzed resistsIBM·Filed 2000·Granted Apr 16, 2002·10 cites·6 claims
- 4970US2022401893A1Poly(quinoline) membranesENTEGRIS INC·Filed 2022·Application pending·0 cites
- 5069US8883395B2Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the sameLIU SEN·Filed 2012·Granted Nov 11, 2014·0 cites·25 claims
Showing the top 50 of 94 patent records by PatentIndex Score.
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