Inventor · disambiguated record
Tsutomu Shimokawa
Also filed as: SHIMOKAWA TSUTOMU
38 granted patents·6 pending applications·617 citations·filing 1990–2016
98Inventor score
Top patents by PatentIndex Score
44 records- 0196US7812105B2Compound, polymer, and radiation-sensitive compositionJSR CORP·Filed 2006·Granted Oct 12, 2010·25 cites·19 claims
- 0295US6531260B2Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Mar 11, 2003·54 cites·12 claims
- 0394US7897821B2Sulfonium compoundJSR CORP·Filed 2010·Granted Mar 1, 2011·15 cites·1 claims
- 0493US7288359B2Radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Oct 30, 2007·33 cites·13 claims
- 0593US7037994B2Acenaphthylene derivative, polymer, and antireflection film-forming compositionJSR CORP·Filed 2003·Granted May 2, 2006·32 cites·15 claims
- 0692US5110706AI-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additiveJAPAN SYNTHETIC RUBBER CO LTD·Filed 1990·Granted May 5, 1992·83 cites·4 claims
- 0789US6964840B2Radiation-sensitive resin compositionIBM·Filed 2004·Granted Nov 15, 2005·28 cites·6 claims
- 0888US6753124B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Jun 22, 2004·33 cites·19 claims
- 0985US8173351B2Compound and radiation-sensitive compositionSHIMIZU DAISUKE·Filed 2008·Granted May 8, 2012·6 cites·10 claims
- 1081US8211624B2Method for pattern formation and resin composition for use in the methodNAKAMURA ATSUSHI·Filed 2008·Granted Jul 3, 2012·6 cites·19 claims
- 1181US7108955B2Polysiloxane, process for production thereof and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Sep 19, 2006·20 cites·17 claims
- 1281US6933094B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Aug 23, 2005·17 cites·5 claims
- 1380US6852791B2Anti-reflection coating forming compositionJSR CORP·Filed 2001·Granted Feb 8, 2005·17 cites·12 claims
- 1479US6800414B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Oct 5, 2004·35 cites·20 claims
- 1578US8119324B2Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer filmSUGITA HIKARU·Filed 2007·Granted Feb 21, 2012·5 cites·17 claims
- 1677US7202016B2Radiation-sensitive resin compositionJSR CORP·Filed 2005·Granted Apr 10, 2007·4 cites·17 claims
- 1776US7244549B2Pattern forming method and bilayer filmJSR CORP·Filed 2002·Granted Jul 17, 2007·30 cites·21 claims
- 1875US6623907B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Sep 23, 2003·35 cites·12 claims
- 1975US6517992B1N-sulfonyloxyimide compound and radiation-sensitive resin composition using the sameJSR CORP·Filed 2000·Granted Feb 11, 2003·15 cites·21 claims
- 2074US8377627B2Compound and radiation-sensitive compositionJSR CORP·Filed 2008·Granted Feb 19, 2013·2 cites·6 claims
- 2174US6828078B2Composition having refractive index sensitively changeable by radiation and method for forming refractive index patternJSR CORP·Filed 2001·Granted Dec 7, 2004·11 cites·27 claims
- 2271US8431324B2Radiation-sensitive resin compositionSHIMOKAWA TSUTOMU·Filed 2010·Granted Apr 30, 2013·3 cites·4 claims
- 2371US6821705B2Radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Nov 23, 2004·11 cites·13 claims
- 2470US6482568B1Radiation-sensitive resin compositionJSR CORP·Filed 2000·Granted Nov 19, 2002·28 cites·18 claims
- 2570US5432039ARadiation sensitive quinone diazide and resin composition for microlensJAPAN SYNTHETIC RUBBER CO LTD·Filed 1993·Granted Jul 11, 1995·24 cites·15 claims
- 2667US11384172B2Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting methodJSR CORP·Filed 2016·Granted Jul 12, 2022·1 cites·11 claims
- 2760US6299785B1Electrode formation processJSR CORP·Filed 1999·Granted Oct 9, 2001·24 cites·14 claims
- 2858US7297461B2Radiation sensitive resin compositionJSR CORP·Filed 2004·Granted Nov 20, 2007·3 cites·26 claims
- 2958US6846895B2Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Jan 25, 2005·3 cites·20 claims
- 3055US7108954B2Radiation-sensitive composition changing in refractive index and method of changing refractive indexJSR CORP·Filed 2001·Granted Sep 19, 2006·4 cites·16 claims
- 3155US2014363773A1Pattern-forming methodJSR CORP·Filed 2014·Application pending·0 cites
- 3252US2007248911A1Pattern forming method and bilayer filmIWASAWA HARUO·Filed 2007·Application pending·0 cites
- 3349US8450045B2Pattern forming methodSUGITA HIKARU·Filed 2012·Granted May 28, 2013·0 cites·5 claims
- 3449US2012156621A1Radiation-sensitive resin compositionNAKAMURA ATSUSHI·Filed 2012·Application pending·0 cites
- 3544US8173348B2Method of forming pattern and composition for forming of organic thin-film for use thereinSHIMIZU DAISUKE·Filed 2007·Granted May 8, 2012·0 cites·5 claims
- 3644US6770780B1Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin compositionJSR CORP·Filed 2000·Granted Aug 3, 2004·1 cites·7 claims
- 3742US9348226B2Radiation-sensitive resin compositionNISHIMURA ISAO·Filed 2003·Granted May 24, 2016·2 cites·14 claims
- 3841US10415011B2Adherend recovery method, adherend recovery apparatus, gas-generating film and resin compositionJSR CORP·Filed 2016·Granted Sep 17, 2019·0 cites·6 claims
- 3940US6830868B2Anthracene derivative and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Dec 14, 2004·3 cites·20 claims
- 4040US6824954B2Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using sameJSR CORP·Filed 2002·Granted Nov 30, 2004·4 cites·17 claims
- 4138US7105269B2Copolymer, polymer mixture, and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Sep 12, 2006·0 cites·16 claims
- 4237US2008026314A1Silane Compound, Polysiloxane, and Radiation-Sensitive Resin CompositionNISHIMURA ISAO·Filed 2004·Application pending·0 cites
- 4336US2011143279A1Radiation-sensitive resin compositionJSR CORP·Filed 2011·Application pending·0 cites
- 4434US2008187859A1Radiation-Sensitive Resin CompositionNISHIMURA ISAO·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →