Inventor · disambiguated record
Nobuji Matsumura
Also filed as: MATSUMURA NOBUJI
11 granted patents·3 pending applications·19 citations·filing 2006–2013
84Inventor score
Top patents by PatentIndex Score
14 records- 0183US8507575B2Radiation-sensitive resin composition, polymer, and compoundMATSUMURA NOBUJI·Filed 2011·Granted Aug 13, 2013·7 cites·22 claims
- 0278US8119324B2Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer filmSUGITA HIKARU·Filed 2007·Granted Feb 21, 2012·5 cites·17 claims
- 0370US8697331B2Compound, polymer, and radiation-sensitive compositionSAKAKIBARA HIROKAZU·Filed 2010·Granted Apr 15, 2014·2 cites·7 claims
- 0468US8808974B2Method for forming patternJSR CORP·Filed 2013·Granted Aug 19, 2014·2 cites·4 claims
- 0567US8361691B2Radiation-sensitive composition and process for producing low-molecular compound for use thereinJSR CORP·Filed 2007·Granted Jan 29, 2013·2 cites·4 claims
- 0654US8273837B2Compound, polymer, and resin compositionNAGAI TOMOKI·Filed 2006·Granted Sep 25, 2012·1 cites·5 claims
- 0752US8771923B2Radiation-sensitive compositionJSR CORP·Filed 2012·Granted Jul 8, 2014·0 cites·5 claims
- 0849US8450045B2Pattern forming methodSUGITA HIKARU·Filed 2012·Granted May 28, 2013·0 cites·5 claims
- 0947US2010068650A1Positive-working radiation-sensitive composition and method for resist pattern formation using the compositionNISHIMURA YUKIO·Filed 2008·Application pending·0 cites
- 1044US8173348B2Method of forming pattern and composition for forming of organic thin-film for use thereinSHIMIZU DAISUKE·Filed 2007·Granted May 8, 2012·0 cites·5 claims
- 1137US8530692B2Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compoundMATSUMURA NOBUJI·Filed 2011·Granted Sep 10, 2013·0 cites·11 claims
- 1237US2011151378A1Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming methodJSR CORP·Filed 2010·Application pending·0 cites
- 1334US2006188812A1Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin compositionNAGAI TOMOKI·Filed 2006·Application pending·0 cites
- 1431US8921027B2Radiation-sensitive resin compositionSERIZAWA RYUICHI·Filed 2011·Granted Dec 30, 2014·0 cites·4 claims
Join the waitlist — get patent alerts
Get an alert when Nobuji Matsumura files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →