Inventor · disambiguated record
Denis M. Koosau
Also filed as: KOOSAU DENIS · KOOSAU DENIS M · KOOSAU DENIS MARTIN
21 granted patents·10 pending applications·193 citations·filing 2006–2025
94Inventor score
Top patents by PatentIndex Score
31 records- 0198US10103010B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Oct 16, 2018·34 cites·10 claims
- 0298US9947517B1Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·48 cites·20 claims
- 0396US10991556B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·11 cites·20 claims
- 0496US10553404B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·13 cites·20 claims
- 0596US10504702B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·14 cites·20 claims
- 0693US11393710B2Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2017·Granted Jul 19, 2022·9 cites·15 claims
- 0793US7436645B2Method and apparatus for controlling temperature of a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Oct 14, 2008·37 cites·14 claims
- 0892US10964584B2Process kit ring adaptorAPPLIED MATERIALS INC·Filed 2019·Granted Mar 30, 2021·7 cites·20 claims
- 0991US12094752B2Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2022·Granted Sep 17, 2024·1 cites·10 claims
- 1089US8591286B2Apparatus and method for temperature control during polishingCHEN HUNG CHIH·Filed 2010·Granted Nov 26, 2013·8 cites·20 claims
- 1185US12009236B2Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2019·Granted Jun 11, 2024·3 cites·7 claims
- 1283US11043400B2Movable and removable process kitAPPLIED MATERIALS INC·Filed 2018·Granted Jun 22, 2021·3 cites·17 claims
- 1380US8460067B2Polishing head zone boundary smoothingCHEN HUNG CHIH·Filed 2010·Granted Jun 11, 2013·4 cites·20 claims
- 1478US12148645B2Calibration jig and calibration methodAPPLIED MATERIALS INC·Filed 2024·Granted Nov 19, 2024·0 cites·20 claims
- 1576US2024429088A1Wafer edge ring lifting solutionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1674US12435963B2Apparatus and method for controlling edge ring variationAPPLIED MATERIALS INC·Filed 2023·Granted Oct 7, 2025·0 cites·8 claims
- 1774US2024321610A1Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1867US10586718B2Cooling base with spiral channels for ESCAPPLIED MATERIALS INC·Filed 2016·Granted Mar 10, 2020·1 cites·18 claims
- 1966US11842917B2Process kit ring adaptorAPPLIED MATERIALS INC·Filed 2021·Granted Dec 12, 2023·0 cites·20 claims
- 2066US11668553B2Apparatus and method for controlling edge ring variationAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·0 cites·16 claims
- 2160US12185433B2High-temperature substrate support assembly with failure protectionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 31, 2024·0 cites·18 claims
- 2259US11935773B2Calibration jig and calibration methodAPPLIED MATERIALS INC·Filed 2019·Granted Mar 19, 2024·0 cites·13 claims
- 2359US2025299929A1Substrate support assembly having an edge voltage delivery systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2457US2025014878A1Wafer edge profile control using connected edge ring hardwareAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2555US2025308848A1Plasma processing system configured to deliver a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2654US9050699B2Polishing head zone boundary smoothingAPPLIED MATERIALS INC·Filed 2013·Granted Jun 9, 2015·0 cites·20 claims
- 2745US2014020829A1Sensors in Carrier Head of a CMP SystemCHEN HUNG CHIH·Filed 2012·Application pending·0 cites
- 2843US2019228952A1Processing with powered edge ringAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2942US2010099266A1Etch reactor suitable for etching high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3037US2012021673A1Substrate holder to reduce substrate edge stress during chemical mechanical polishingCHEN HUNG CHIH·Filed 2010·Application pending·0 cites
- 3137US2009014323A1High temperature cathode for plasma etchingYENDLER BORIS·Filed 2008·Application pending·0 cites
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