Inventor · disambiguated record
Takahiro Dazai
Also filed as: DAZAI TAKAHIRO
53 granted patents·24 pending applications·254 citations·filing 2006–2025
98Inventor score
Top patents by PatentIndex Score
77 records- 0194US8192915B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted Jun 5, 2012·21 cites·14 claims
- 0293US8795948B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·12 cites·3 claims
- 0393US8221956B2Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compoundSHIONO DAIJU·Filed 2009·Granted Jul 17, 2012·20 cites·9 claims
- 0492US7960091B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Jun 14, 2011·15 cites·13 claims
- 0591US8394578B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Mar 12, 2013·9 cites·3 claims
- 0691US8323869B2Positive resist composition and method of forming resist patternSHIMIZU HIROAKI·Filed 2010·Granted Dec 4, 2012·8 cites·10 claims
- 0791US8227170B2Resist composition, method of forming resist pattern, polymeric compound, and compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 24, 2012·11 cites·20 claims
- 0890US8329378B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted Dec 11, 2012·9 cites·12 claims
- 0990US8268529B2Positive resist composition, method of forming resist pattern using the same, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Sep 18, 2012·9 cites·11 claims
- 1090US8182976B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted May 22, 2012·13 cites·16 claims
- 1189US11466114B2Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Oct 11, 2022·2 cites·7 claims
- 1287US9442371B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 1387US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 1485US8999631B2Primer and pattern forming method for layer including block copolymerSENZAKI TAKAHIRO·Filed 2011·Granted Apr 7, 2015·7 cites·6 claims
- 1585US8987386B2Method of producing polymeric compound, resist composition, and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2012·Granted Mar 24, 2015·5 cites·4 claims
- 1685US8236477B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 1785US8105749B2Polymer compound, positive resist composition, and method of forming resist patternDAZAI TAKAHIRO·Filed 2010·Granted Jan 31, 2012·4 cites·11 claims
- 1883US9567477B2Undercoat agent and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Feb 14, 2017·4 cites·4 claims
- 1982US8541529B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2012·Granted Sep 24, 2013·3 cites·6 claims
- 2081US8404428B2Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compoundMATSUMIYA TASUKU·Filed 2010·Granted Mar 26, 2013·3 cites·7 claims
- 2180US9644110B2Method of producing structure containing phase-separated structure and method of forming top coat filmTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted May 9, 2017·2 cites·20 claims
- 2280US8642244B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2011·Granted Feb 4, 2014·3 cites·7 claims
- 2380US8232041B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 31, 2012·12 cites·10 claims
- 2479US9206307B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Dec 8, 2015·2 cites·17 claims
- 2578US8846838B2Fluorine-containing block copolymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Sep 30, 2014·2 cites·1 claims
- 2678US7767379B2Polymer compound, positive resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 3, 2010·16 cites·6 claims
- 2776US8475997B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundSHIONO DAIJU·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 2876US8088553B2Positive resist composition, method of forming resist pattern, and polymeric compoundSHIMIZU HIROAKI·Filed 2009·Granted Jan 3, 2012·4 cites·8 claims
- 2974US7604920B2Positive resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Oct 20, 2009·10 cites·8 claims
- 3073US8632960B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Jan 21, 2014·2 cites·12 claims
- 3173US2025011616A1Method for producing structure body including phase-separated structure, and compositionTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3272US2024360267A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3372US2025011622A1Block copolymer, undercoat agent, resin composition for forming phase-separated structure, and method for producing structure body including phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3472US2024361686A1Method for manufacturing etching mask pattern, and resin composition for forming etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3572US2024368393A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3671US2025066636A1Resin composition for forming phase-separated structure and method for producing structure having phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3770US9051648B2Substrate provided with metal nanostructure on surface thereof and method of producing the sameFUJIKAWA SHIGENORI·Filed 2011·Granted Jun 9, 2015·1 cites·3 claims
- 3870US7919651B2Positive resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Apr 5, 2011·0 cites·8 claims
- 3970US2025147413A1Method for producing structure having phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 4070US2024182701A1Resin composition for forming phase-separated structure, method of producing structure containing phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 4170US2024182623A1Method of producing block copolymer, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 4270US2025197550A1Resin composition for forming phase-separated structure, method for producing structure having phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 4369US9188869B2Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 17, 2015·1 cites·11 claims
- 4469US2025271751A1Photosensitive composition, photosensitive film, lower layer film, method for producing structure having phase-separated structure, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2025·Application pending·0 cites
- 4569US2025197551A1Resin composition for forming phase-separated structure, method for producing structure having phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 4667US8487056B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2012·Granted Jul 16, 2013·4 cites·6 claims
- 4767US7741009B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 22, 2010·2 cites·5 claims
- 4866US7914967B2Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 29, 2011·1 cites·11 claims
- 4963US11472956B2Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 18, 2022·0 cites·5 claims
- 5063US9690194B2Method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Jun 27, 2017·1 cites·8 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →