Inventor · disambiguated record
Yoichiro Numasawa
Also filed as: NUMASAWA YOICHIRO
12 granted patents·6 pending applications·155 citations·filing 1997–2012
91Inventor score
Top patents by PatentIndex Score
18 records- 0177US7589002B2Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the methodANELVA CORP·Filed 2008·Granted Sep 15, 2009·2 cites·7 claims
- 0277US6664496B2Plasma processing systemANELVA CORP·Filed 2002·Granted Dec 16, 2003·13 cites·5 claims
- 0373US7666763B2Nanosilicon semiconductor substrate manufacturing method and semiconductor circuit device using nanosilicon semiconductor substrate manufactured by the methodCANON ANELVA CORP·Filed 2008·Granted Feb 23, 2010·4 cites·8 claims
- 0473US6070552ASubstrate processing apparatusANELVA CORP·Filed 1998·Granted Jun 6, 2000·26 cites·5 claims
- 0572US7091138B2Forming method and a forming apparatus of nanocrystalline silicon structureANELVA CORP·Filed 2004·Granted Aug 15, 2006·15 cites·8 claims
- 0669US6059985AMethod of processing a substrate and apparatus for the methodANELVA CORP·Filed 1997·Granted May 9, 2000·37 cites·12 claims
- 0767US6083361ASputter deviceANELVA CORP·Filed 1998·Granted Jul 4, 2000·35 cites·27 claims
- 0864US8002947B2Plasma treatment system and cleaning method of the sameSANYO ELECTRIC CO·Filed 2008·Granted Aug 23, 2011·0 cites·5 claims
- 0960US7530359B2Plasma treatment system and cleaning method of the sameCANON ANELVA CORP·Filed 2002·Granted May 12, 2009·4 cites·5 claims
- 1054US2007262307A1Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the methodNUMASAWA YOICHIRO·Filed 2007·Application pending·0 cites
- 1154US2009260974A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemNUMASAWA YOICHIRO·Filed 2009·Application pending·0 cites
- 1250US9437768B2Photoelectric conversion deviceNUMASAWA YOICHIRO·Filed 2012·Granted Sep 6, 2016·0 cites·14 claims
- 1350US2012100309A1Plasma treatment apparatus and plasma cvd apparatusMIYAIRI HIDEKAZU·Filed 2011·Application pending·0 cites
- 1449US2007086939A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemNUMASAWA YOICHIRO·Filed 2006·Application pending·0 cites
- 1548US2004035691A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemFiled 2003·Application pending·0 cites
- 1647US6016765APlasma processing apparatusANELVA CORP·Filed 1997·Granted Jan 25, 2000·7 cites·21 claims
- 1745US5956616AMethod of depositing thin films by plasma-enhanced chemical vapor depositionANELVA CORP·Filed 1997·Granted Sep 21, 1999·12 cites·14 claims
- 1823US2006276055A1Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the methodNUMASAWA YOICHIRO·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →