Inventor · disambiguated record
Yoji Mashiko
Also filed as: MASHIKO YOJI
16 granted patents·2 pending applications·259 citations·filing 1980–2003
94Inventor score
Top patents by PatentIndex Score
18 records- 0188US5112771AMethod of fibricating a semiconductor device having a trenchMITSUBISHI ELECTRIC CORP·Filed 1989·Granted May 12, 1992·90 cites·6 claims
- 0265US4853341AProcess for forming electrodes for semiconductor devices using focused ion beamsMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Aug 1, 1989·23 cites·18 claims
- 0365US4314874AMethod for forming a fine pattern of an aluminum filmMITSUBISHI ELECTRIC CORP·Filed 1980·Granted Feb 9, 1982·28 cites·6 claims
- 0460US4962059AProcess for forming electrodes for semiconductor devices using focused ion beam depositionMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Oct 9, 1990·19 cites·65 claims
- 0557US4691078AAluminum circuit to be disconnected and method of cutting the sameMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Sep 1, 1987·14 cites·2 claims
- 0652US5162233AMethod of detecting and analyzing impuritiesMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Nov 10, 1992·16 cites·8 claims
- 0751US4414242AProcess for fabricating a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1982·Granted Nov 8, 1983·15 cites·8 claims
- 0848US4636400AMethod of treating silicon nitride film formed by plasma depositionMITSUBISHI ELECTRIC CORP·Filed 1985·Granted Jan 13, 1987·11 cites·3 claims
- 0945US4377734AMethod for forming patterns by plasma etchingMITSUBISHI ELECTRIC CORP·Filed 1980·Granted Mar 22, 1983·14 cites·4 claims
- 1044US4990489ARead only memory device including a superconductive electrodeMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Feb 5, 1991·10 cites·13 claims
- 1139US2004203257A1Processing method of semiconductor substrateRENESAS TECH CORP·Filed 2003·Application pending·0 cites
- 1238US6545470B2Scanning probe microscopeMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Apr 8, 2003·3 cites·10 claims
- 1336US4723062AAluminum circuit to be disconnected and method of cutting the sameMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Feb 2, 1988·4 cites·2 claims
- 1435US2003047810A1Electronic device having multilayer interconnection structureMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 1534US5130273AMethod for manufacturing a read only memory device using a focused ion beam to alter superconductivityMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Jul 14, 1992·5 cites·12 claims
- 1632US5043290AProcess for forming electrodes for semiconductor devices by focused ion beam technologyMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Aug 27, 1991·2 cites·16 claims
- 1731US4948749AProcess for forming electrodes for semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Aug 14, 1990·3 cites·64 claims
- 1831US4843238AMethod for identifying a blistered film in layered filmsMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jun 27, 1989·2 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →