Inventor · disambiguated record
Ching-Yueh Chen
Also filed as: CHEN CHING-YUEH
13 granted patents·3 pending applications·19 citations·filing 2002–2025
87Inventor score
Top patents by PatentIndex Score
16 records- 0191US10126666B2Apparatus and a method of forming a particle shieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 13, 2018·6 cites·20 claims
- 0287US10168626B2Apparatus and a method of forming a particle shieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·4 cites·20 claims
- 0386US2024385507A1Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0484US12124163B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 22, 2024·0 cites·20 claims
- 0584US11402743B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·1 cites·20 claims
- 0680US11860530B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·0 cites·20 claims
- 0777US10698313B2Apparatus and method for developing a photoresist coated substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 30, 2020·1 cites·20 claims
- 0875US2025244679A1Method of manufacturing semiconductor devices using a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0971US12287581B2Method of manufacturing semiconductor devices using a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 29, 2025·0 cites·20 claims
- 1067US10969682B2Apparatus and method for developing a photoresist coated substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 6, 2021·0 cites·20 claims
- 1164US11226551B2Lithographic mask, a pellicle therein and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 18, 2022·0 cites·20 claims
- 1257US6838214B1Method of fabrication of rim-type phase shift maskTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jan 4, 2005·5 cites·29 claims
- 1357US2025237941A1Pellicle for euv applicationsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1456US10802395B2Lithographic mask, a pellicle therein and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 13, 2020·0 cites·20 claims
- 1549US10788764B2Apparatus and a method of forming a particle shieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 29, 2020·0 cites·20 claims
- 1648US6924069B2Method for repairing attenuated phase shift masksTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Aug 2, 2005·2 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →