Inventor · disambiguated record
Koutarou Takahashi
Also filed as: TAKAHASHI KOUTAROU
11 granted patents·1 pending application·14 citations·filing 2011–2017
82Inventor score
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12 records- 0193US10120281B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 6, 2018·6 cites·20 claims
- 0280US8735048B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming methodINASAKI TAKESHI·Filed 2011·Granted May 27, 2014·4 cites·15 claims
- 0373US8889339B2Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanksTSUCHIHASHI TORU·Filed 2013·Granted Nov 18, 2014·2 cites·12 claims
- 0469US10139727B2Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Granted Nov 27, 2018·1 cites·18 claims
- 0565US9904168B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Feb 27, 2018·1 cites·10 claims
- 0651US9285679B2Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the compositionFUJIFILM CORP·Filed 2014·Granted Mar 15, 2016·0 cites·36 claims
- 0745US9316908B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming patternFUJIFILM CORP·Filed 2014·Granted Apr 19, 2016·0 cites·18 claims
- 0842US10545405B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jan 28, 2020·0 cites·17 claims
- 0942US10526266B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compoundFUJIFILM CORP·Filed 2016·Granted Jan 7, 2020·0 cites·20 claims
- 1038US10324374B2Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compoundFUJIFILM CORP·Filed 2016·Granted Jun 18, 2019·0 cites·22 claims
- 1138US10011576B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compoundFUJIFILM CORP·Filed 2016·Granted Jul 3, 2018·0 cites·11 claims
- 1237US2017003591A1Manufacturing method for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank comprising actinic ray-sensitive or radiation-sensitive film, photo mask, forming method for pattern, manufacturing method for electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Application pending·0 cites
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