Inventor · disambiguated record
Tadateru Yatsuo
Also filed as: YATSUO TADATERU
7 granted patents·2 pending applications·11 citations·filing 2008–2015
76Inventor score
Top patents by PatentIndex Score
9 records- 0180US8735048B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming methodINASAKI TAKESHI·Filed 2011·Granted May 27, 2014·4 cites·15 claims
- 0280US8637222B2Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist patternTSUCHIHASHI TORU·Filed 2010·Granted Jan 28, 2014·4 cites·16 claims
- 0373US8889339B2Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanksTSUCHIHASHI TORU·Filed 2013·Granted Nov 18, 2014·2 cites·12 claims
- 0468US9625813B2Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compoundFUJIFILM CORP·Filed 2013·Granted Apr 18, 2017·1 cites·20 claims
- 0552US9034560B2Negative resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2014·Granted May 19, 2015·0 cites·13 claims
- 0651US2008241745A1Negative resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 0747US8778593B2Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the compositionTSUCHIMURA TOMOTAKA·Filed 2012·Granted Jul 15, 2014·0 cites·15 claims
- 0836US2012003585A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUBAKI HIDEAKI·Filed 2010·Application pending·0 cites
- 0934US10007180B2Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist filmFUJIFILM CORP·Filed 2015·Granted Jun 26, 2018·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →