Inventor · disambiguated record
Takeshi Inasaki
Also filed as: INASAKI TAKESHI
17 granted patents·8 pending applications·20 citations·filing 2007–2019
88Inventor score
Top patents by PatentIndex Score
25 records- 0184US8329379B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameITO TAKAYUKI·Filed 2010·Granted Dec 11, 2012·6 cites·21 claims
- 0282US9235116B2Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternFUJIFILM CORP·Filed 2013·Granted Jan 12, 2016·3 cites·19 claims
- 0380US8735048B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming methodINASAKI TAKESHI·Filed 2011·Granted May 27, 2014·4 cites·15 claims
- 0478US8673538B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the compositionINASAKI TAKESHI·Filed 2012·Granted Mar 18, 2014·3 cites·18 claims
- 0576US9826129B2Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method thereforFUJIFILM CORP·Filed 2015·Granted Nov 21, 2017·2 cites·12 claims
- 0675US11294279B2Lithographic printing plate precursor, and method for producing lithographic printing plateFUJIFILM CORP·Filed 2019·Granted Apr 5, 2022·2 cites·19 claims
- 0758US9563121B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the compositionFUJIFILM CORP·Filed 2014·Granted Feb 7, 2017·0 cites·13 claims
- 0852US9235120B2Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomaskFUJIFILM CORP·Filed 2014·Granted Jan 12, 2016·0 cites·13 claims
- 0952US9091927B2Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the compositionFUJIFILM CORP·Filed 2013·Granted Jul 28, 2015·0 cites·13 claims
- 1051US9285679B2Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the compositionFUJIFILM CORP·Filed 2014·Granted Mar 15, 2016·0 cites·36 claims
- 1149US2007231671A1Catalyst Material For Use In Fuel Cell, Catalyst Membrane, Membrane Electrode Assembly and Fuel CellFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 1247US11117364B2Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compoundFUJIFILM CORP·Filed 2019·Granted Sep 14, 2021·0 cites·11 claims
- 1346US9223204B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameITO TAKAYUKI·Filed 2012·Granted Dec 29, 2015·0 cites·17 claims
- 1446US8614033B2Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist compositionTSUCHIMURA TOMOTAKA·Filed 2012·Granted Dec 24, 2013·0 cites·20 claims
- 1545US11543750B2Lithographic printing plate precursor and method for producing lithographic printing plateFUJIFILM CORP·Filed 2019·Granted Jan 3, 2023·0 cites·17 claims
- 1645US10921712B2Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and color developing compoundFUJIFILM CORP·Filed 2018·Granted Feb 16, 2021·0 cites·15 claims
- 1743US2018154671A1Planographic printing plate precursor and plate-making methodFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 1842US2013084518A1Negative chemical amplification resist composition, resist film, and, resist-coated mask blanks, method for forming resist pattern, and photomask, each using the sameFUJIFILM CORP·Filed 2012·Application pending·0 cites
- 1941US8574814B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the compositionINASAKI TAKESHI·Filed 2012·Granted Nov 5, 2013·0 cites·17 claims
- 2040US2018321586A1Planographic printing plate precursor, method of preparing planographic printing plate, and organic-inorganic hybrid particleFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 2139US2012202141A1Chemical amplification type positive resist composition, and resist film, resist coated mask blanks and resist pattern forming method using the compositionINASAKI TAKESHI·Filed 2012·Application pending·0 cites
- 2237US8895222B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2010·Granted Nov 25, 2014·0 cites·10 claims
- 2337US2016178816A1Near-infrared-absorbing composition, near-infrared cut filter obtained using same, process for producing said cut filter, camera module and process for producing same, and solid photographing elementFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 2437US2016077256A1Near-infrared-absorbing composition, near-infrared cut-off filter and production method using same, and camera moduleFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 2535US2016103247A1Near infrared radiation-absorbing composition, near infrared radiation cut-off filter and production method therefor, and camera module and production method thereforFUJIFILM CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →