Inventor · disambiguated record
Tianniu Chen
Also filed as: CHEN TIANNIU · CHEN TIANNIU R · CHEN TIANNIU RICK
53 granted patents·18 pending applications·383 citations·filing 2003–2020
98Inventor score
Top patents by PatentIndex Score
71 records- 0198US7838329B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Nov 23, 2010·55 cites·21 claims
- 0297US9537095B2Tellurium compounds useful for deposition of tellurium containing materialsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·14 cites·20 claims
- 0396US8796068B2Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2013·Granted Aug 5, 2014·12 cites·10 claims
- 0495US9649712B2Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipmentADVANCED TECH MATERIALS·Filed 2015·Granted May 16, 2017·6 cites·30 claims
- 0595US9221114B2Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipmentCHEN TIANNIU·Filed 2012·Granted Dec 29, 2015·19 cites·88 claims
- 0695US8802882B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsWANG ZIYUN·Filed 2010·Granted Aug 12, 2014·15 cites·20 claims
- 0795US8008117B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Aug 30, 2011·14 cites·20 claims
- 0894US9731368B2Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipmentENTEGRIS INC·Filed 2015·Granted Aug 15, 2017·5 cites·26 claims
- 0994US7198815B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2005·Granted Apr 3, 2007·19 cites·8 claims
- 1093US9976111B2TiN hard mask and etch residual removalAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·5 cites·30 claims
- 1193US9102693B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2014·Granted Aug 11, 2015·8 cites·20 claims
- 1293US8877549B2Low temperature deposition of phase change memory materialsADVANCED TECH MATERIALS·Filed 2014·Granted Nov 4, 2014·7 cites·19 claims
- 1393US8288198B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2007·Granted Oct 16, 2012·11 cites·18 claims
- 1493US8268665B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsHUNKS WILLIAM·Filed 2011·Granted Sep 18, 2012·12 cites·20 claims
- 1593US7781605B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2009·Granted Aug 24, 2010·14 cites·20 claims
- 1693US7371878B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2007·Granted May 13, 2008·14 cites·20 claims
- 1792US9222018B1Titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2015·Granted Dec 29, 2015·8 cites·30 claims
- 1892US8709863B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2012·Granted Apr 29, 2014·9 cites·22 claims
- 1990US9831088B2Composition and process for selectively etching metal nitridesCHEN TIANNIU·Filed 2011·Granted Nov 28, 2017·15 cites·12 claims
- 2089US9074169B2Lithographic tool in situ clean formulationsCHEN TIANNIU·Filed 2010·Granted Jul 7, 2015·10 cites·16 claims
- 2188US8093140B2Amorphous Ge/Te deposition processCHEN PHILIP S H·Filed 2008·Granted Jan 10, 2012·11 cites·20 claims
- 2288US7638074B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsADVANCED TECH MATERIALS·Filed 2007·Granted Dec 29, 2009·9 cites·19 claims
- 2388US6960675B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2003·Granted Nov 1, 2005·28 cites·36 claims
- 2486US9873833B2Etchant solutions and method of use thereofAIR PROD & CHEM·Filed 2015·Granted Jan 23, 2018·3 cites·24 claims
- 2586US8206784B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsXU CHONGYING·Filed 2009·Granted Jun 26, 2012·8 cites·23 claims
- 2683US9534285B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·3 cites·13 claims
- 2782US7601860B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 13, 2009·17 cites·2 claims
- 2879US7964746B2Copper precursors for CVD/ALD/digital CVD of copper metal filmsADVANCED TECH MATERIALS·Filed 2008·Granted Jun 21, 2011·3 cites·14 claims
- 2977US7858816B2Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Dec 28, 2010·3 cites·20 claims
- 3076US11035044B2Etching solution for tungsten and GST filmsVERSUM MAT US LLC·Filed 2018·Granted Jun 15, 2021·1 cites·25 claims
- 3176US10332784B2Selectively removing titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2016·Granted Jun 25, 2019·2 cites·11 claims
- 3275US8784936B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsXU CHONGYING·Filed 2012·Granted Jul 22, 2014·2 cites·11 claims
- 3374US9783558B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2015·Granted Oct 10, 2017·1 cites·20 claims
- 3473US9219232B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsENTEGRIS INC·Filed 2014·Granted Dec 22, 2015·1 cites·20 claims
- 3573US8168811B2Precursors for CVD/ALD of metal-containing filmsCAMERON THOMAS M·Filed 2009·Granted May 1, 2012·2 cites·19 claims
- 3672US9472420B2Composition for titanium nitride hard mask and etch residue removalAIR PROD & CHEM·Filed 2014·Granted Oct 18, 2016·2 cites·21 claims
- 3771US9034688B2Antimony compounds useful for deposition of antimony-containing materialsADVANCED TECH MATERIALS·Filed 2014·Granted May 19, 2015·2 cites·20 claims
- 3869US10072237B2Photoresist cleaning composition used in photolithography and a method for treating substrate therewithAIR PROD & CHEM·Filed 2016·Granted Sep 11, 2018·1 cites·20 claims
- 3967US10400167B2Etching compositions and methods for using sameVERSUM MAT US LLC·Filed 2016·Granted Sep 3, 2019·1 cites·22 claims
- 4066US10301580B2Stripping compositions having high WN/W etching selectivityVERSUM MAT US LLC·Filed 2015·Granted May 28, 2019·1 cites·29 claims
- 4164US9976037B2Composition for treating surface of substrate, method and deviceAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·1 cites·23 claims
- 4264US7423166B2Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2003·Granted Sep 9, 2008·8 cites·36 claims
- 4364US2015321279A1Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipmentADVANCED TECH MATERIALS·Filed 2015·Application pending·0 cites
- 4463US2009215225A1Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 4562US8679894B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2012·Granted Mar 25, 2014·0 cites·20 claims
- 4661US8674127B2Antimony compounds useful for deposition of antimony-containing materialsCHEN TIANNIU·Filed 2009·Granted Mar 18, 2014·1 cites·26 claims
- 4760US12298669B2Composition comprising three alkanolamines and a hydroxylamine for removing etch residuesVERSUM MAT US LLC·Filed 2020·Granted May 13, 2025·0 cites·11 claims
- 4859US7709384B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2008·Granted May 4, 2010·0 cites·20 claims
- 4958US2012108038A1Amorphous ge/te deposition processCHEN PHILIP S H·Filed 2012·Application pending·0 cites
- 5058US2009087561A1Metal and metalloid silylamides, ketimates, tetraalkylguanidinates and dianionic guanidinates useful for cvd/ald of thin filmsADVANCED TECH MATERIALS·Filed 2008·Application pending·0 cites
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