Inventor · disambiguated record
Ryoichi Takasu
Also filed as: TAKASU RYOICHI
10 granted patents·1 pending application·120 citations·filing 2003–2008
89Inventor score
Top patents by PatentIndex Score
11 records- 0197US7371510B2Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 13, 2008·44 cites·10 claims
- 0291US6936400B2Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 30, 2005·40 cites·27 claims
- 0374US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 0468US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 0566US7914967B2Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 29, 2011·1 cites·11 claims
- 0663US7989138B2Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 2, 2011·7 cites·19 claims
- 0757US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 0857US7326512B2Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Feb 5, 2008·4 cites·23 claims
- 0943US7914968B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Mar 29, 2011·0 cites·6 claims
- 1035US2006141400A1Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming methodHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 1133US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →