Inventor · disambiguated record
Seiji Matsuura
Also filed as: MATSUURA SEIJI
15 granted patents·6 pending applications·131 citations·filing 1992–2017
92Inventor score
Files withNEC CORP9NEC ELECTRONICS CORP5MITSUBISHI MATERIALS CORP3RENESAS ELECTRONICS CORP2SONY CORP2
Top patents by PatentIndex Score
21 records- 0194US7295286B2Exposure device and method of exposureNEC ELECTRONICS CORP·Filed 2006·Granted Nov 13, 2007·23 cites·6 claims
- 0276US7572558B2Photomask and exposure methodNEC ELECTRONICS CORP·Filed 2007·Granted Aug 11, 2009·4 cites·6 claims
- 0369US6058807ACutting tool and method for producing the sameMITSUBISHI MATERIALS CORP·Filed 1998·Granted May 9, 2000·24 cites·20 claims
- 0460US6310684B1Method of measuring spherical aberration in projection systemNEC CORP·Filed 2000·Granted Oct 30, 2001·6 cites·7 claims
- 0559US6208469B1Method of adjusting reduction projection exposure deviceNEC CORP·Filed 1999·Granted Mar 27, 2001·25 cites·7 claims
- 0657US7537864B2Hole pattern design method and photomaskNEC ELECTRONICS CORP·Filed 2004·Granted May 26, 2009·4 cites·10 claims
- 0754US6200076B1Cutting tool and method for producing the sameMITSUBISHI MATERIALS CORP·Filed 2000·Granted Mar 13, 2001·5 cites·6 claims
- 0853US6160623AMethod for measuring an aberration of a projection optical systemNEC CORP·Filed 2000·Granted Dec 12, 2000·4 cites·13 claims
- 0950US6271919B1Semiconductor device and alignment apparatus and alignment method for sameNEC CORP·Filed 1999·Granted Aug 7, 2001·14 cites·5 claims
- 1046US6013395APhotomask for use in exposure and method for producing sameNEC CORP·Filed 1998·Granted Jan 11, 2000·10 cites·19 claims
- 1140US2018217505A1Method for inspecting mask pattern, method for manufacturing mask, and method for manufacturing semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2017·Application pending·0 cites
- 1239US10281821B2Exposure apparatus, exposure method, and device manufacturing methodRENESAS ELECTRONICS CORP·Filed 2017·Granted May 7, 2019·0 cites·14 claims
- 1339US2001028457A1Semiconductor device and alignment apparatus and alignment method for sameNEC CORP·Filed 2001·Application pending·0 cites
- 1438US6084678AMethod of alignment between mask pattern and wafer patternNEC CORP·Filed 1998·Granted Jul 4, 2000·7 cites·19 claims
- 1538US5663220AAcoustic vibrational material from fiber-reinforced polybutadiene-modified epoxy resinSONY CORP·Filed 1992·Granted Sep 2, 1997·4 cites·5 claims
- 1637US2001002559A1Cutting tool and method for producing the sameMITSUBISHI MATERIALS CORP·Filed 2001·Application pending·0 cites
- 1737US2010296069A1Pattern division method, pattern division processing apparatus and information storage medium on which is stored a programNEC ELECTRONICS CORP·Filed 2010·Application pending·0 cites
- 1837US2003087535A1Film coating formation methodNEC ELECTRONICS CORP·Filed 2002·Application pending·0 cites
- 1936US2002075458A1Method for correcting spherical aberration of a projection lens in an exposure systemNEC CORP·Filed 2001·Application pending·0 cites
- 2030US6335125B2Photomask and method of manufacturing sameNEC CORP·Filed 1999·Granted Jan 1, 2002·1 cites·5 claims
- 2130US6037411AAcoustic vibrational material of fiber reinforcement with epoxy resin and epoxy-reactive polybutadieneSONY CORP·Filed 1995·Granted Mar 14, 2000·0 cites·5 claims
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