Inventor · disambiguated record
Ikuo Ogoh
Also filed as: OGOH IKUO
18 granted patents·527 citations·filing 1987–1996
96Inventor score
Files withMITSUBISHI ELECTRIC CORP18
Top patents by PatentIndex Score
18 records- 0191US5254866ALDD CMOS with wider oxide sidewall on PMOS than NMOSMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 19, 1993·76 cites·6 claims
- 0290US5101250AElectrically programmable non-volatile memory device and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Mar 31, 1992·99 cites·13 claims
- 0389US5547885AMethod of making asymmetric LDD transistorMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Aug 20, 1996·66 cites·11 claims
- 0485US5436482AMOSFET with assymetric lightly doped source-drain regionsMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jul 25, 1995·44 cites·9 claims
- 0582US5849616AMethod of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Dec 15, 1998·40 cites·3 claims
- 0679US5101251ASemiconductor memory device with improved stacked capacitor structureMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Mar 31, 1992·38 cites·11 claims
- 0774US5323343ADRAM device comprising a stacked type capacitor and a method of manufacturing thereofMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jun 21, 1994·33 cites·12 claims
- 0861US5231041AManufacturing method of an electrically programmable non-volatile memory device having the floating gate extending over the control gateMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Jul 27, 1993·22 cites·4 claims
- 0956US6078079ASemiconductor device and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jun 20, 2000·18 cites·6 claims
- 1052US5001039AMethod of manufacturing semiconductor device comprising step of patterning resist and light irradiation apparatus used by the manufacturing methodMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Mar 19, 1991·8 cites·5 claims
- 1149US4905068ASemiconductor device having interconnection layers of T-shape cross sectionMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Feb 27, 1990·16 cites·13 claims
- 1247US5097137ALight irradiation apparatus used in manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Mar 17, 1992·7 cites·3 claims
- 1346US5153689ASemiconductor memory device having bit lines formed of an interconnecting layer of lower reflectance material than the material of the word linesMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Oct 6, 1992·14 cites·7 claims
- 1446US4903117ASemiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Feb 20, 1990·13 cites·13 claims
- 1543US4956692ASemiconductor device having an isolation oxide filmMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Sep 11, 1990·11 cites·4 claims
- 1636US5075240ASemiconductor device manufactured by using conductive ion implantation maskMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Dec 24, 1991·8 cites·10 claims
- 1735US5300444AMethod of manufacturing a semiconductor device having a stacked structure formed of polycrystalline silicon film and silicon oxide filmMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Apr 5, 1994·9 cites·20 claims
- 1833US4772569AMethod for forming oxide isolation films on french sidewallsMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Sep 20, 1988·5 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →