Inventor · disambiguated record
Ronald A. Dellaguardia
Also filed as: DELLAGUARDIA RONALD · DELLAGUARDIA RONALD A · DELLAGUARDIA RONALD ANTHONY
14 granted patents·2 pending applications·424 citations·filing 1992–2007
94Inventor score
Top patents by PatentIndex Score
16 records- 0195US6042997ACopolymers and photoresist compositions comprising copolymer resin binder componentIBM·Filed 1998·Granted Mar 28, 2000·115 cites·20 claims
- 0293US7514361B2Selective thin metal cap processIBM·Filed 2007·Granted Apr 7, 2009·28 cites·6 claims
- 0390US5861231ACopolymers and photoresist compositions comprising copolymer resin binder componentSHIPLEY CO LLC·Filed 1996·Granted Jan 19, 1999·69 cites·5 claims
- 0487US6365321B1Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulationsIBM·Filed 1999·Granted Apr 2, 2002·62 cites·69 claims
- 0585US6203965B1Photoresist comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 2000·Granted Mar 20, 2001·19 cites·4 claims
- 0678US7253100B2Reducing damage to ulk dielectric during cross-linked polymer removalIBM·Filed 2005·Granted Aug 7, 2007·5 cites·20 claims
- 0774US7214603B2Method for fabricating interconnect structures with reduced plasma damageIBM·Filed 2005·Granted May 8, 2007·6 cites·28 claims
- 0864US6103447AApproach to formulating irradiation sensitive positive resistsIBM·Filed 1998·Granted Aug 15, 2000·25 cites·27 claims
- 0963US7598169B2Method to remove beol sacrificial materials and chemical residues by irradiationIBM·Filed 2007·Granted Oct 6, 2009·1 cites·32 claims
- 1063US5264328AResist development endpoint detection for X-ray lithographyIBM·Filed 1992·Granted Nov 23, 1993·17 cites·18 claims
- 1161US6207353B1Resist formulation which minimizes blistering during etchingIBM·Filed 1997·Granted Mar 27, 2001·28 cites·20 claims
- 1258US6303263B1Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groupsINTERNAT BUSINESS MACHINES MAC·Filed 1998·Granted Oct 16, 2001·24 cites·24 claims
- 1354US6074800APhoto acid generator compounds, photo resists, and method for improving biasIBM·Filed 1998·Granted Jun 13, 2000·16 cites·9 claims
- 1446US2008315347A1Providing gaps in capping layer to reduce tensile stress for beol fabrication of integrated circuitsIBM·Filed 2007·Application pending·0 cites
- 1543US6268436B1Approach to formulating irradiation sensitive positive resistsIBM·Filed 1999·Granted Jul 31, 2001·9 cites·6 claims
- 1641US2007166648A1Integrated lithography and etch for dual damascene structuresIBM·Filed 2006·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ronald A. Dellaguardia files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →