Inventor · disambiguated record
Toru Tojo
Also filed as: TOJO TORU
47 granted patents·3 pending applications·1,553 citations·filing 1979–2008
99Inventor score
Top patents by PatentIndex Score
50 records- 0198US4480284AElectrostatic chuck plateTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Oct 30, 1984·470 cites·4 claims
- 0296US4532423AIC Tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be testedTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Jul 30, 1985·144 cites·12 claims
- 0394US4811062AMethod for aligning first and second objects relative to each other and apparatus for practicing this methodTOSHIBA KK·Filed 1988·Granted Mar 7, 1989·82 cites·23 claims
- 0490US7345755B2Defect inspecting apparatus and defect inspection methodTOSHIBA KK·Filed 2005·Granted Mar 18, 2008·12 cites·24 claims
- 0590US6281510B1Sample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 2000·Granted Aug 28, 2001·52 cites·17 claims
- 0690US6084716AOptical substrate inspection apparatusTOSHIBA KK·Filed 1998·Granted Jul 4, 2000·89 cites·21 claims
- 0785US7590277B2Pattern inspecting methodTOSHIBA KK·Filed 2005·Granted Sep 15, 2009·15 cites·11 claims
- 0884US7508526B2Defect inspecting apparatusTOSHIBA KK·Filed 2005·Granted Mar 24, 2009·7 cites·10 claims
- 0983US6090176ASample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 1998·Granted Jul 18, 2000·62 cites·7 claims
- 1080US5744381AMethod of inspecting a pattern formed on a sample for a defect, and an apparatus thereofTOSHIBA KK·Filed 1996·Granted Apr 28, 1998·60 cites·9 claims
- 1180US4572956AElectron beam pattern transfer system having an autofocusing mechanismTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Feb 25, 1986·21 cites·18 claims
- 1279US4262974ALinear bearing apparatusTOKYO SHIBAURA ELECTRIC CO·Filed 1979·Granted Apr 21, 1981·29 cites·6 claims
- 1378US7123345B2Automatic focusing apparatusTOSHIBA KK·Filed 2004·Granted Oct 17, 2006·16 cites·20 claims
- 1478US4902133AMethod and an apparatus for aligning first and second objects with each otherTOSHIBA KK·Filed 1988·Granted Feb 20, 1990·25 cites·49 claims
- 1575US7526119B2Pattern inspection apparatusTOSHIBA KK·Filed 2003·Granted Apr 28, 2009·21 cites·22 claims
- 1675US6346354B1Pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 12, 2002·12 cites·10 claims
- 1774US7551767B2Pattern inspection apparatusTOSHIBA KK·Filed 2008·Granted Jun 23, 2009·5 cites·9 claims
- 1874US6080990APosition measuring apparatusTOPCON CORP·Filed 1998·Granted Jun 27, 2000·36 cites·10 claims
- 1973US5960106ASample inspection apparatus and sample inspection methodTOSHIBA KK·Filed 1995·Granted Sep 28, 1999·57 cites·28 claims
- 2072US7421109B2Pattern inspection apparatusTOSHIBA KK·Filed 2003·Granted Sep 2, 2008·13 cites·9 claims
- 2172US7304730B2Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography maskTOSHIBA KK·Filed 2004·Granted Dec 4, 2007·8 cites·8 claims
- 2271US7522276B2Pattern inspection methodTOSHIBA KK·Filed 2008·Granted Apr 21, 2009·2 cites·22 claims
- 2370US4578607APiezoelectric precise rotation mechanism for slightly rotating an objectTOSHIBA KK·Filed 1984·Granted Mar 25, 1986·20 cites·10 claims
- 2469US5912468ACharged particle beam exposure systemTOSHIBA KK·Filed 1997·Granted Jun 15, 1999·22 cites·10 claims
- 2569US5404410AMethod and system for generating a bit patternTOSHIBA KK·Filed 1994·Granted Apr 4, 1995·38 cites·5 claims
- 2667US7415149B2Pattern inspection apparatusTOSHIBA KK·Filed 2007·Granted Aug 19, 2008·3 cites·7 claims
- 2767US6901314B2Alignment apparatus for substratesTOSHIBA KK·Filed 2003·Granted May 31, 2005·10 cites·20 claims
- 2867US4984890AMethod and an apparatus for aligning first and second objects with each otherTOSHIBA KK·Filed 1989·Granted Jan 15, 1991·15 cites·24 claims
- 2967US4455501APrecision rotation mechanismTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Jun 19, 1984·28 cites·24 claims
- 3065US7359546B2Defect inspection apparatus and defect inspection methodTOSHIBA KK·Filed 2005·Granted Apr 15, 2008·4 cites·20 claims
- 3163US7372560B2Pattern inspection apparatusTOSHIBA KK·Filed 2004·Granted May 13, 2008·3 cites·22 claims
- 3263US7075621B2Alignment methodTOSHIBA KK·Filed 2004·Granted Jul 11, 2006·8 cites·20 claims
- 3362US6411023B1Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons from ion pumpTOSHIBA MACHINE CO LTD·Filed 2000·Granted Jun 25, 2002·5 cites·6 claims
- 3459US6676289B2Temperature measuring method in pattern drawing apparatusTOSHIBA KK·Filed 2001·Granted Jan 13, 2004·10 cites·2 claims
- 3558US4469949AElectron beam pattern transfer device and method for aligning mask and semiconductor waferTOSHIBA KK·Filed 1982·Granted Sep 4, 1984·21 cites·12 claims
- 3656US4698513APosition detector by vibrating a light beam for averaging the reflected lightTOKYO SHIBAURA ELECTRIC CO·Filed 1987·Granted Oct 6, 1987·14 cites·19 claims
- 3751US5379348APattern defects inspection systemTOSHIBA KK·Filed 1993·Granted Jan 3, 1995·22 cites·18 claims
- 3851US2008030719A1Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography maskINOUE HIROMU·Filed 2007·Application pending·0 cites
- 3951US2008121799A1Sample analyzing apparatusKANNO CHOHEI·Filed 2007·Application pending·0 cites
- 4050US5828457ASample inspection apparatus and sample inspection methodTOSHIBA KK·Filed 1997·Granted Oct 27, 1998·14 cites·28 claims
- 4148US4558225ATarget body position measuring method for charged particle beam fine pattern exposure systemTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Dec 10, 1985·15 cites·10 claims
- 4246US6182369B1Pattern forming apparatusTOSHIBA KK·Filed 1998·Granted Feb 6, 2001·10 cites·6 claims
- 4346US5602645APattern evaluation apparatus and a method of pattern evaluationTOSHIBA KK·Filed 1995·Granted Feb 11, 1997·12 cites·13 claims
- 4445US4808002AMethod and device for aligning first and second objects relative to each otherTOSHIBA KK·Filed 1988·Granted Feb 28, 1989·7 cites·19 claims
- 4542US6239443B1Apparatus for emitting a beam to a sample used for manufacturing a semiconducor deviceTOSHIBA KK·Filed 1998·Granted May 29, 2001·7 cites·8 claims
- 4641US2006239535A1Pattern defect inspection method and apparatusTOPCON CORP·Filed 2006·Application pending·0 cites
- 4740US5812259AMethod and apparatus for inspecting slight defects in a photomask patternTOPCON CORP·Filed 1996·Granted Sep 22, 1998·7 cites·7 claims
- 4840US4467210AElectron-beam image transfer deviceTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Aug 21, 1984·9 cites·6 claims
- 4939US6100970AApparatus for inspecting slight defects on a photomask patternTOPCON CORP·Filed 1998·Granted Aug 8, 2000·6 cites·8 claims
- 5038US4408126ACassette retaining device of electron beam apparatusTOSHIBA MACHINE CO LTD·Filed 1981·Granted Oct 4, 1983·5 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →