Inventor · disambiguated record
Yukiyasu Arisawa
Also filed as: ARISAWA YUKIYASU
9 granted patents·3 pending applications·52 citations·filing 2006–2018
84Inventor score
Top patents by PatentIndex Score
12 records- 0195US7941767B2Photomask management method and photomask wash limit generating methodTOSHIBA KK·Filed 2008·Granted May 10, 2011·32 cites·15 claims
- 0290US8039177B2Method of correcting a flare and computer program productTOSHIBA KK·Filed 2010·Granted Oct 18, 2011·9 cites·20 claims
- 0380US8443311B2Flare value calculation method, flare correction method, and computer program productARISAWA YUKIYASU·Filed 2011·Granted May 14, 2013·5 cites·19 claims
- 0478US7636910B2Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2006·Granted Dec 22, 2009·4 cites·13 claims
- 0563US8617773B2Method of correcting mask pattern, computer program product, and method of manufacturing semiconductor deviceUNO TAIGA·Filed 2011·Granted Dec 31, 2013·1 cites·14 claims
- 0660US7446852B2Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program projectTOSHIBA KK·Filed 2007·Granted Nov 4, 2008·1 cites·10 claims
- 0756US2010112812A1Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2009·Application pending·0 cites
- 0851US7912275B2Method of evaluating a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Mar 22, 2011·0 cites·13 claims
- 0948US8507160B2Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable mediumUNO TAIGA·Filed 2011·Granted Aug 13, 2013·0 cites·11 claims
- 1040US10290498B2Imprint apparatus and imprint methodTOSHIBA MEMORY CORP·Filed 2018·Granted May 14, 2019·0 cites·18 claims
- 1135US2006190875A1Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patternsARISAWA YUKIYASU·Filed 2006·Application pending·0 cites
- 1235US2011262867A1Method of creating an evaluation map, system, method of manufacturing a semiconductor device and computer program productUNO TAIGA·Filed 2011·Application pending·0 cites
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