Inventor · disambiguated record
Chang-Jyh Hsieh
Also filed as: HSIEH CHANG-JYH
8 granted patents·3 pending applications·26 citations·filing 1990–2015
82Inventor score
Files withUNITED MICROELECTRONICS CORP5LU CHI-TA1NAT SCIENCE COUNCIL1TAIWAN SEMICONDUCTOR MFG1TAIWAN SEMICONDUCTOR MFG CO LTD1
Top patents by PatentIndex Score
11 records- 0178US8986911B2Multiple-patterning photolithographic mask and methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Mar 24, 2015·2 cites·20 claims
- 0263US8650511B2Lithography performance check methods and apparatusLU CHI-TA·Filed 2010·Granted Feb 11, 2014·1 cites·20 claims
- 0363US7297450B2Optical proximity correction methodUNITED MICROELECTRONICS CORP·Filed 2006·Granted Nov 20, 2007·1 cites·28 claims
- 0461US6638664B2Optical mask correction methodUNITED MICROELECTRONICS CORP·Filed 2001·Granted Oct 28, 2003·7 cites·7 claims
- 0554US9513552B2Multiple-patterning photolithographic mask and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 6, 2016·0 cites·20 claims
- 0651US7063923B2Optical proximity correction methodUNITED MICROELECTRONICS CORP·Filed 2004·Granted Jun 20, 2006·2 cites·14 claims
- 0741US2004194050A1Optical proximity correction methodFiled 2004·Application pending·0 cites
- 0840US5091274AIonic conducting polymer electrolytes based on a side-chain crystalline polymerNAT SCIENCE COUNCIL·Filed 1990·Granted Feb 25, 1992·10 cites·1 claims
- 0939US2004009409A1Optical proximity correction methodFiled 2002·Application pending·0 cites
- 1038US6767679B2Correcting the polygon feature pattern with an optical proximity correction methodUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jul 27, 2004·3 cites·5 claims
- 1134US2003039892A1Method of optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →