Inventor · disambiguated record
Steven D. Golladay
Also filed as: GOLLADAY STEVEN · GOLLADAY STEVEN D · GOLLADAY STEVEN DOUGLAS
23 granted patents·464 citations·filing 1977–2019
96Inventor score
Top patents by PatentIndex Score
23 records- 0190US6180947B1Multi-element deflection aberration correction for electron beam lithographyNIKON CORP·Filed 1998·Granted Jan 30, 2001·62 cites·19 claims
- 0289US5614833AObjective lens with large field deflection system and homogeneous large area secondary electron extraction fieldIBM·Filed 1995·Granted Mar 25, 1997·55 cites·17 claims
- 0383US6069684AElectron beam projection lithography system (EBPS)IBM·Filed 1998·Granted May 30, 2000·42 cites·18 claims
- 0480US10886102B2Multiple electron beam irradiation apparatus, multiple electron beam irradiation method, and multiple electron beam inspection apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Jan 5, 2021·2 cites·5 claims
- 0580US6218671B1On-line dynamic corrections adjustment methodNIKON CORP·Filed 1998·Granted Apr 17, 2001·36 cites·11 claims
- 0678US6590216B1Servo control for high emittance electron sourceNIKON CORP·Filed 2000·Granted Jul 8, 2003·14 cites·20 claims
- 0778US4843330AElectron beam contactless testing system with grid bias switchingIBM·Filed 1986·Granted Jun 27, 1989·35 cites·13 claims
- 0875US5404110ASystem using induced current for contactless testing of wiring networksIBM·Filed 1993·Granted Apr 4, 1995·30 cites·20 claims
- 0975US4943769AApparatus and method for opens/shorts testing of capacitively coupled networks in substrates using electron beamsIBM·Filed 1989·Granted Jul 24, 1990·34 cites·5 claims
- 1071US4101813ADouble deflection system for an electron beam deviceUS ENERGY·Filed 1977·Granted Jul 18, 1978·12 cites·7 claims
- 1167US6091187AHigh emittance electron source having high illumination uniformityIBM·Filed 1998·Granted Jul 18, 2000·19 cites·17 claims
- 1266US5057773AMethod for opens/shorts testing of capacitively coupled networks in substrates using electron beamsIBM·Filed 1990·Granted Oct 15, 1991·29 cites·3 claims
- 1362US6069363AMagnetic-electrostatic symmetric doublet projection lensIBM·Filed 1998·Granted May 30, 2000·15 cites·11 claims
- 1458US6005250AIllumination deflection system for E-beam projectionNIKON CORP·Filed 1998·Granted Dec 21, 1999·12 cites·17 claims
- 1557US5821542AParticle beam imaging system having hollow beam illuminationIBM·Filed 1996·Granted Oct 13, 1998·12 cites·18 claims
- 1654US5612626ASystem using induced current for contactless testing of wiring networksIBM·Filed 1994·Granted Mar 18, 1997·13 cites·22 claims
- 1753US6420713B1Image position and lens field control in electron beam systemsNIKON CORP·Filed 1999·Granted Jul 16, 2002·10 cites·24 claims
- 1851US6596999B2High performance source for electron beam projection lithographyNIKON CORP·Filed 2001·Granted Jul 22, 2003·1 cites·20 claims
- 1947US5606261ARetarding field electron-optical apparatusIBM·Filed 1996·Granted Feb 25, 1997·6 cites·22 claims
- 2045US6296976B1Compensation of within-subfield linewidth variation in e-beam projection lithographyNIKON CORP·Filed 1999·Granted Oct 2, 2001·6 cites·26 claims
- 2144US6353231B1Pinhole detector for electron intensity distributionNIKON CORP·Filed 1998·Granted Mar 5, 2002·14 cites·16 claims
- 2241US6023067ABlanking system for electron beam projection systemNIKON CORP·Filed 1998·Granted Feb 8, 2000·4 cites·21 claims
- 2332US6201251B1Compensation of space charge in a particle beam systemNIKON CORP·Filed 1998·Granted Mar 13, 2001·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →