Inventor · disambiguated record
Werner Stickel
Also filed as: STICKEL WERNER
23 granted patents·534 citations·filing 1981–2001
97Inventor score
Top patents by PatentIndex Score
23 records- 0193US4417203ASystem for contactless electrical property testing of multi-layer ceramicsIBM·Filed 1981·Granted Nov 22, 1983·67 cites·28 claims
- 0290US6180947B1Multi-element deflection aberration correction for electron beam lithographyNIKON CORP·Filed 1998·Granted Jan 30, 2001·62 cites·19 claims
- 0389US5466904AElectron beam lithography systemIBM·Filed 1993·Granted Nov 14, 1995·54 cites·23 claims
- 0484US5633507AElectron beam lithography system with low brightnessIBM·Filed 1995·Granted May 27, 1997·44 cites·18 claims
- 0583US6069684AElectron beam projection lithography system (EBPS)IBM·Filed 1998·Granted May 30, 2000·42 cites·18 claims
- 0681US5545902AElectron beam lithography systemIBM·Filed 1995·Granted Aug 13, 1996·34 cites·37 claims
- 0776US4859856ATelecentric sub-field deflection with vailIBM·Filed 1988·Granted Aug 22, 1989·21 cites·7 claims
- 0872US5798528ACorrection of pattern dependent position errors in electron beam lithographyIBM·Filed 1997·Granted Aug 25, 1998·28 cites·21 claims
- 0972US5708274ACurvilinear variable axis lens correction with crossed coilsIBM·Filed 1996·Granted Jan 13, 1998·25 cites·11 claims
- 1071US6617585B1Optimized curvilinear variable axis lens doublet for charged particle beam projection systemNIKON CORP·Filed 2000·Granted Sep 9, 2003·9 cites·13 claims
- 1167US5434424ASpinning reticle scanning projection lithography exposure system and methodIBM·Filed 1994·Granted Jul 18, 1995·19 cites·9 claims
- 1264US5674413AScattering reticle for electron beam systemsIBM·Filed 1995·Granted Oct 7, 1997·23 cites·6 claims
- 1362US5712488AElectron beam performance measurement system and method thereofIBM·Filed 1996·Granted Jan 27, 1998·15 cites·20 claims
- 1458US6005250AIllumination deflection system for E-beam projectionNIKON CORP·Filed 1998·Granted Dec 21, 1999·12 cites·17 claims
- 1557US6483117B1Symmetric blanking for high stability in electron beam exposure systemsNIKON CORP·Filed 1999·Granted Nov 19, 2002·13 cites·20 claims
- 1656US5751004AProjection reticle transmission control for coulomb interaction analysisIBM·Filed 1997·Granted May 12, 1998·12 cites·18 claims
- 1755US5936252ACharged particle beam performance measurement system and method thereofIBM·Filed 1997·Granted Aug 10, 1999·11 cites·22 claims
- 1855US5285074ADynamic compensation of non-linear electron beam landing angle in variable axis lensesIBM·Filed 1992·Granted Feb 8, 1994·14 cites·17 claims
- 1953US6420713B1Image position and lens field control in electron beam systemsNIKON CORP·Filed 1999·Granted Jul 16, 2002·10 cites·24 claims
- 2051US6596999B2High performance source for electron beam projection lithographyNIKON CORP·Filed 2001·Granted Jul 22, 2003·1 cites·20 claims
- 2148US6541783B1Stencil reticle incorporating scattering features for electron beam projection lithographyNIKON CORP·Filed 1999·Granted Apr 1, 2003·7 cites·30 claims
- 2247US4737644AConductive coated semiconductor electrostatic deflection platesIBM·Filed 1985·Granted Apr 12, 1988·7 cites·12 claims
- 2341US6023067ABlanking system for electron beam projection systemNIKON CORP·Filed 1998·Granted Feb 8, 2000·4 cites·21 claims
Join the waitlist — get patent alerts
Get an alert when Werner Stickel files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →