Inventor · disambiguated record
Matthias Stender
Also filed as: STENDER MATTHIAS
23 granted patents·11 pending applications·169 citations·filing 2006–2022
95Inventor score
Files withADVANCED TECH MATERIALS9VERSUM MAT US LLC9DAETWYLER SEALING TECH DEUTSCHLAND GMBH3AIR PROD & CHEM2CHEN PHILIP S H2
Top patents by PatentIndex Score
34 records- 0198US7838329B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Nov 23, 2010·55 cites·21 claims
- 0297US9537095B2Tellurium compounds useful for deposition of tellurium containing materialsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·14 cites·20 claims
- 0396US8796068B2Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2013·Granted Aug 5, 2014·12 cites·10 claims
- 0495US8008117B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Aug 30, 2011·14 cites·20 claims
- 0593US8877549B2Low temperature deposition of phase change memory materialsADVANCED TECH MATERIALS·Filed 2014·Granted Nov 4, 2014·7 cites·19 claims
- 0693US8288198B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2007·Granted Oct 16, 2012·11 cites·18 claims
- 0793US8268665B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsHUNKS WILLIAM·Filed 2011·Granted Sep 18, 2012·12 cites·20 claims
- 0892US8709863B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2012·Granted Apr 29, 2014·9 cites·22 claims
- 0988US10144850B2Stop-on silicon containing layer additiveAIR PROD & CHEM·Filed 2016·Granted Dec 4, 2018·6 cites·2 claims
- 1088US8093140B2Amorphous Ge/Te deposition processCHEN PHILIP S H·Filed 2008·Granted Jan 10, 2012·11 cites·20 claims
- 1187US7625991B2Method for making alkoxy-siloxane polyether carboxylates terminated with functional olefin groupsKERR CORP·Filed 2007·Granted Dec 1, 2009·4 cites·11 claims
- 1284US10253216B2Additives for barrier chemical mechanical planarizationVERSUM MAT US LLC·Filed 2017·Granted Apr 9, 2019·4 cites·34 claims
- 1376US11111435B2Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topographyVERSUM MAT US LLC·Filed 2019·Granted Sep 7, 2021·2 cites·7 claims
- 1474US9797818B2Testing device for testing seals having anchoring feetDAETWYLER SEALING TECH DEUTSCHLAND GMBH·Filed 2014·Granted Oct 24, 2017·3 cites·9 claims
- 1573US9219232B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsENTEGRIS INC·Filed 2014·Granted Dec 22, 2015·1 cites·20 claims
- 1672US8778211B2GST CMP slurriesSTENDER MATTHIAS·Filed 2012·Granted Jul 15, 2014·3 cites·24 claims
- 1763US2009215225A1Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 1862US8679894B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2012·Granted Mar 25, 2014·0 cites·20 claims
- 1961US11884859B2Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topographyVERSUM MAT US LLC·Filed 2021·Granted Jan 30, 2024·0 cites·8 claims
- 2061US10570313B2Dishing reducing in tungsten chemical mechanical polishingAIR PROD & CHEM·Filed 2016·Granted Feb 25, 2020·1 cites·5 claims
- 2158US2012108038A1Amorphous ge/te deposition processCHEN PHILIP S H·Filed 2012·Application pending·0 cites
- 2254US8524931B2Precursor compositions for ALD/CVD of group II ruthenate thin filmsXU CHONGYING·Filed 2007·Granted Sep 3, 2013·0 cites·4 claims
- 2354US2011060165A1Metal aminotroponiminates, bis-oxazolinates and guanidinatesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 2453US2024247090A1Imidazolium-based poly(ionic liquid)s and use thereforeVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2551US2024400861A1Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization SlurriesVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2651US2019062598A1Stop-On Silicon Containing Layer AdditiveVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
- 2749US2025019568A1Tungsten Chemical Mechanical Polishing SlurriesVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2849US2024261931A1Phosphonium Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization SlurriesVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2947US2010279011A1Novel bismuth precursors for cvd/ald of thin filmsADVANCED TECH MATERIALS·Filed 2008·Application pending·0 cites
- 3046US11643599B2Tungsten chemical mechanical polishing for reduced oxide erosionVERSUM MAT US LLC·Filed 2019·Granted May 9, 2023·0 cites·16 claims
- 3144US11592128B2Sealing profile for embedding into a moulding of curable materialDAETWYLER SEALING TECH DEUTSCHLAND GMBH·Filed 2018·Granted Feb 28, 2023·0 cites·12 claims
- 3244US8920667B2Chemical-mechanical polishing composition containing zirconia and metal oxidizerCABOT MICROELECTRONICS CORP·Filed 2013·Granted Dec 30, 2014·0 cites·25 claims
- 3343US2009162550A1Copper (i) amidinates and guanidinates, mixed ligand copper complexes, and compositions for chemical vapor deposition, atomic layer deposition, and rapid vapor deposition of copperADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 3435US2019195070A1Sealing profile for embedding into a moulding of curable materialDAETWYLER SEALING TECH DEUTSCHLAND GMBH·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →