Inventor · disambiguated record
Kyoung-Mi Kim
Also filed as: KIM KYOUNG · KIM KYOUNG-MI
28 granted patents·10 pending applications·187 citations·filing 2003–2023
96Inventor score
Files withSAMSUNG ELECTRONICS CO LTD19KIM KYOUNG-MI6BALBOA MFG COMPANY LLC3ANGIOLAB INC2PARK JEONG-JU2
Top patents by PatentIndex Score
38 records- 0192US10437145B2Method of detaching a pellicle from a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 8, 2019·4 cites·4 claims
- 0289US7419759B2Photoresist composition and method of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 2, 2008·13 cites·17 claims
- 0388US9880462B2Pellicle and exposure mask including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jan 30, 2018·3 cites·15 claims
- 0486USD751768SWinged mask with pipingBALBOA MFG COMPANY LLC·Filed 2013·Granted Mar 15, 2016·40 cites·1 claims
- 0586USD729457SWinged maskBALBOA MFG COMPANY LLC·Filed 2013·Granted May 12, 2015·39 cites·1 claims
- 0684US9491979B2Balaclava with removable face maskBALBOA MFG COMPANY LLC·Filed 2014·Granted Nov 15, 2016·19 cites·16 claims
- 0784US8071484B2Method of forming fine pattern employing self-aligned double patterningKIM KYOUNG-MI·Filed 2008·Granted Dec 6, 2011·11 cites·20 claims
- 0882US9437452B2Method of forming a fine pattern by using block copolymersSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Sep 6, 2016·4 cites·5 claims
- 0982US7485327B2Composition comprising Melissa leaf extract for anti-angiogenic and matrix metalloproteinase inhibitory activityANGIOLAB INC·Filed 2003·Granted Feb 3, 2009·21 cites·4 claims
- 1080US7387988B2Thinner composition and method of removing photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·4 cites·12 claims
- 1179US7736527B2Siloxane polymer compositions and methods of manufacturing a capacitor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 15, 2010·6 cites·6 claims
- 1274US9218969B2Method for reducing intermixing between films of a patterning process, patterning process, and device manufactured by the patterning processKIM KYOUNG MI·Filed 2011·Granted Dec 22, 2015·3 cites·19 claims
- 1372US7026497B2Adhesive compound and method for forming photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 11, 2006·3 cites·20 claims
- 1471US7863231B2Thinner composition and method of removing photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jan 4, 2011·1 cites·6 claims
- 1570US7070910B2Silazane compound amd methods for using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jul 4, 2006·1 cites·13 claims
- 1669US8377626B2Methods of forming a pattern using negative-type photoresist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Feb 19, 2013·2 cites·16 claims
- 1769US7572831B2Composition containing chalconeANGIOLAB INC·Filed 2004·Granted Aug 11, 2009·6 cites·13 claims
- 1863US7776730B2Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 17, 2010·2 cites·14 claims
- 1962US7985347B2Methods of forming a pattern and methods of manufacturing a capacitor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 26, 2011·2 cites·13 claims
- 2062US7282319B2Photoresist composition and method of forming a pattern using sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 16, 2007·1 cites·21 claims
- 2159US9962331B2Composition containing horse chestnut extractKIM MIN YOUNG·Filed 2004·Granted May 8, 2018·0 cites·17 claims
- 2255US7053030B2Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 30, 2006·2 cites·8 claims
- 2350US7258963B2Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Aug 21, 2007·0 cites·14 claims
- 2449US7442489B2Photoresist composition and method of forming a photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 28, 2008·0 cites·16 claims
- 2549US2025130914A1Heterogeneous big data-compatible gateway and artificial intelligence deep learning-based risk detection systemRMA CO LTD·Filed 2023·Application pending·0 cites
- 2644US8450444B2Siloxane polymer compositionKIM KYOUNG-MI·Filed 2010·Granted May 28, 2013·0 cites·5 claims
- 2744US2008102403A1Photoresist compositions and methods of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2843US8685865B2Method of forming patterns of semiconductor devicePARK JEONG-JU·Filed 2012·Granted Apr 1, 2014·0 cites·20 claims
- 2941US2006166134A1Photoresist composition and method of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3039US8551689B2Methods of manufacturing semiconductor devices using photolithographyPARK MI-RA·Filed 2011·Granted Oct 8, 2013·0 cites·23 claims
- 3139US2020385753A1Composition for base editing for animal embryo and base editing methodINST BASIC SCIENCE·Filed 2017·Application pending·0 cites
- 3238US2005266343A1Photoresist composition and method of forming sameKIM KYOUNG-MI·Filed 2005·Application pending·0 cites
- 3337US2012064724A1Methods of Forming a Pattern of Semiconductor DevicesLEE BO-HEE·Filed 2011·Application pending·0 cites
- 3437US2006160020A1Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist compositionRYU JINA·Filed 2006·Application pending·0 cites
- 3537US2011129781A1Methods of forming a pattern using photoresist compositionsKIM KYOUNG-MI·Filed 2010·Application pending·0 cites
- 3635US2011300712A1Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist PatternsKIM KYOUNG-MI·Filed 2011·Application pending·0 cites
- 3733US2012064463A1Method of Forming MicropatternsPARK JEONG-JU·Filed 2011·Application pending·0 cites
- 3832US7670748B2Cyclic compound, photoresist composition and method of forming a photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Mar 2, 2010·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →